SCHEMBL7527437

SCHEMBL7527437

O=C1C=Cc2c(cccc2S(=O)(=O)O)C1=O.[N-]=[N+]=N.[N-]=[N+]=[N-]

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPRC P08575 2/20 0.44
KDM4E B2RXH2 2/20 0.35
MEN1 O00255 2/20 0.35
ALDH1A1 P00352 2/20 0.35
MAPT P10636 2/20 0.35
THRB P10828 2/20 0.35
IDO1 P14902 2/20 0.35
HPGD P15428 2/20 0.35
ALOX15 P16050 2/20 0.35
RECQL P46063 2/20 0.35
KMT2A Q03164 2/20 0.35
HSD17B10 Q99714 2/20 0.35
LMNA P02545 1/20 0.35
BCHE P06276 1/20 0.35
POLB P06746 1/20 0.35
PKM P14618 1/20 0.35
PTPN1 P18031 1/20 0.35
ACHE P22303 1/20 0.35
CES1 P23141 1/20 0.35
PTPN22 Q9Y2R2 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL5918197 0.99 PTPRC (0.43) PTPRCKDM4EMEN1ALDH1A1MAPT
Hydrochloric Acid SCHEMBL6760307 0.97 PTPRC (0.44) PTPRCKDM4EMEN1ALDH1A1MAPT
SCHEMBL7070987 0.89 PTPRC (0.49) PTPRCKDM4EMEN1ALDH1A1MAPT
SCHEMBL30485567 0.89 PTPRC (0.49) PTPRCKDM4EMEN1ALDH1A1MAPT
Hydrochloric Acid SCHEMBL27744031 0.88 PTPRC (0.47) PTPRCKDM4EMEN1ALDH1A1MAPT
Nitrogen SCHEMBL27516869 0.86 PTPRC (0.46) PTPRCKDM4EMEN1ALDH1A1MAPT
Nitrogen SCHEMBL27904483 0.84 PTPRC (0.45) PTPRCKDM4EMEN1ALDH1A1MAPT
SCHEMBL8373354 0.81 PTPRC (0.33) PTPRCKDM4EMEN1ALDH1A1MAPT
SCHEMBL1425943 0.80 PTPRC (0.48) PTPRCKDM4EMEN1ALDH1A1MAPT
SCHEMBL823887 0.79 TTR (0.33) PTPRCTTRPGAM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0743559-B1 Controlled-acidity photosensitive compositions for offset printing PLURIMETAL SRL (IT) 2002-03-13 EP claimed
EP-0743559-A1 Controlled-acidity photosensitive compositions for offset printing PLURIMETAL S.R.L. (IT) 1996-11-20 EP claimed
EP-0743559-B1 Controlled-acidity photosensitive compositions for offset printing PLURIMETAL SRL (IT) 2002-03-13 EP disclosed
EP-0743559-A1 Controlled-acidity photosensitive compositions for offset printing PLURIMETAL S.R.L. (IT) 1996-11-20 EP disclosed