SCHEMBL7539062

SCHEMBL7539062

ClC1[CH]CCC(Cl)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9579496 0.83
SCHEMBL1148178 0.73
SCHEMBL28732754 0.72
SCHEMBL1031731 0.72
SCHEMBL11564556 0.72
SCHEMBL11880234 0.72
SCHEMBL1920811 0.69
Methylamine SCHEMBL27878460 0.65
SCHEMBL575223 0.63
SCHEMBL9416085 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 129 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107474173-A A kind of preparation method of polarity conjugated diene polymer 中国石油化工股份有限公司 2017-12-15 CN claimed
US-20240239922-A1 PHOTOCURABLE COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2024-07-18 US disclosed
US-12024579-B2 Curable liquid composition, particulate filler, and compound TOKYO OHKA KOGYO CO., LTD. (JP) 2024-07-02 US disclosed
EP-4386925-A1 ELECTROLYTE SOLUTION, LITHIUM SULFUR SECONDARY BATTERY AND MODULE The School Corporation Kansai University (JP) 2024-06-19 EP disclosed
US-20240192593-A1 PHOTOSENSITIVE COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2024-06-13 US disclosed
US-20240191003-A1 COMPOSITION AND PHOTOSENSITIVE COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2024-06-13 US disclosed
US-11981794-B2 Curable composition, cured product, and compound TOKYO OHKA KOGYO CO., LTD. (JP) 2024-05-14 US disclosed
WO-2024095796-A1 ELECTROLYTE SOLUTION, LITHIUM SULFUR SECONDARY BATTERY AND MODULE 学校法人 関西大学 2024-05-10 WO disclosed
CN-117999296-A Composition and photosensitive composition 东京应化工业株式会社 2024-05-07 CN disclosed
CN-117980346-A Composition and photosensitive composition 东京应化工业株式会社 2024-05-03 CN disclosed
CN-1376143-A Carboxylic acid derivatives and adhesion molecule inhibitors containing the same as the active ingredient TORAY INDUSTRIES (JP) 2002-10-23 CN disclosed
EP-1209147-A1 CARBOXYLIC ACID DERIVATIVES AND ADHESION MOLECULE INHIBITORS CONTAINING THE SAME AS THE ACTIVE INGREDIENT TORAY INDUSTRIES, INC. (JP) 2002-05-29 EP disclosed
US-5750599-A HEAT RESISTANCE, DIMENSIONAL STABILITY, LIQUID CRYSTAL DISPLAYS MITSUI TOATSU CHEMICALS, INC. (JP) 1998-05-12 US disclosed
US-5659039-A YELLOW ORANGE DICHROIC DYES FOR POLARIZING FILMS FOR LIQUID CRYSTAL DISPLAYS MITSUI TOATSU CHEMICALS, INC. (JP) 1997-08-19 US disclosed
EP-0669379-A1 Quinophtalone compounds and polarizing films using same MITSUI TOATSU CHEMICALS, Inc. (JP) 1995-08-30 EP disclosed
US-4801708-A FOR AGRICULTURAL USE CIBA-GEIGY CORPORATION (US) 1989-01-31 US disclosed
EP-0150677-B1 HERBICIDAL AND INSECTICIDAL TRIAZINONES CIBA-GEIGY AG (CH) 1989-01-18 EP disclosed
EP-0150677-A1 Herbicidal and insecticidal triazinones CIBA-GEIGY AG (CH) 1985-08-07 EP disclosed
US-4529737-A Analgesic and anti-inflammatory arylalkanoic acid phthalidyl esters and pharmaceutical compositions thereof RESFAR S.R.I. (IT) 1985-07-16 US disclosed
US-3971825-A (5,6) (10,11) BIS-METHYLENE, BRONCHODILATORS SANKYO COMPANY LIMITED (JA) 1976-07-27 US disclosed