Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | FFAR3 | O14843 | 2/20 | 0.39 |
| ▸ | LCK | P06239 | 1/20 | 0.39 |
| ▸ | FYN | P06241 | 1/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.38 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bicarbonate SCHEMBL544722 | 0.92 | TSHR (0.42) | TSHRFFAR3TP53TRPA1TDP1 | |
| Methacrylic Acid SCHEMBL9779559 | 0.85 | TSHR (0.34) | TSHRTP53TRPA1TDP1 | |
| SCHEMBL2985939 | 0.85 | — | — | |
| SCHEMBL10455447 | 0.85 | — | — | |
| SCHEMBL2985943 | 0.85 | — | — | |
| SCHEMBL13573726 | 0.85 | — | — | |
| SCHEMBL14160685 | 0.85 | — | — | |
| SCHEMBL37839 | 0.85 | — | — | |
| SCHEMBL13222685 | 0.85 | — | — | |
| SCHEMBL7891456 | 0.85 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118290350-A | Heteroaryl and bisheteroaryl derivatives for the treatment of iron death-related disorders | 协同医药发展有限公司 | 2024-07-05 | — | — | CN | disclosed |
| CN-113631535-B | Heteroaryl and bisheteroaryl derivatives for the treatment of iron death-related disorders | 协同医药发展有限公司 | 2024-04-12 | — | — | CN | disclosed |
| CN-101109899-B | Resist composition | DAICEL CHEM | 2011-08-17 | — | — | CN | disclosed |
| CN-101109899-A | Resist composition | DAICEL CHEM (JP) | 2008-01-23 | — | — | CN | disclosed |
| US-20020064731-A1 | Radiation-sensitive mixture and production of relief structures | KIM SON NGUYEN (DE) | 2002-05-30 | — | — | US | disclosed |
| US-6051370-A | Radiation-sensitive mixture | BASF AKTIENGESELLSCHAFT (DE) | 2000-04-18 | — | — | US | disclosed |
| US-5914219-A | Radiation-sensitive mixture and the production of relief structures having improved contrast | BASF AKTIENGESELLSCHAFT (DE) | 1999-06-22 | — | — | US | disclosed |
| US-5846689-A | Positive-working radiation-sensitive mixture and production of relief structures | BASF AKTIENGESELLSCHAFT (DE) | 1998-12-08 | — | — | US | disclosed |
| US-5783354-A | QUATERNARY AMMONIUM COMPOUNDS | BASF AKTIENGESELLSCHAFT (DE) | 1998-07-21 | — | — | US | disclosed |
| US-5759750-A | Radiation-sensitive mixture | BASF AKTIENGESELLSCHAFT (DE) | 1998-06-02 | — | — | US | disclosed |
| US-5389494-A | Radiation-sensitive mixture and production of relief images | BASF AKTIENGESELLSCHAFT (DE) | 1995-02-14 | — | — | US | disclosed |
| US-5368945-A | Coating for cans, food industry | STAMICARBON B.V. (NL) | 1994-11-29 | — | — | US | disclosed |
| US-5252436-A | Process for developing a positive-working photoresist containing poly(p-hydroxystyrene) and sulfonium salt with an aqueous developer containing basic organic compounds | BASF AKTIENGESELLSCHAFT (DE) | 1993-10-12 | — | — | US | disclosed |
| US-5204216-A | RADIATION-SENSITIVE MIXTURE | BASF AKTIENGESELLSCHAFT (DE) | 1993-04-20 | — | — | US | disclosed |
| US-5151341-A | RADIATION-SENSITIVE MIXTURE AND PRODUCTION OF RELIEF STRUCTURES | BASF AKTIENGESELLSCHAFT, (DE) | 1992-09-29 | — | — | US | disclosed |
| US-5110708-A | RADIATION-SENSITIVE MIXTURE AND PRODUCTION OF RELIEF IMAGES | BASF AKTIENGESELLSCHAFT (DE) | 1992-05-05 | — | — | US | disclosed |
| US-5039595-A | Aqueous developer solution having hydroxy-alkyl piperidine for positive-working photoresists | BASF AKTIENGESELLSCHAFT (DE) | 1991-08-13 | — | — | US | disclosed |
| US-5035979-A | Radiation-sensitive mixture | BASF AKTIENGESELLSCHAFT (DE) | 1991-07-30 | — | — | US | disclosed |
| US-5034305-A | Mixtures for photoresists of water insolublr binders soluble in alkaline mixtures, compound forming a strong acid and solubility inhibitors | BASF AKTIENGESELLSCHAFT (DE) | 1991-07-23 | — | — | US | disclosed |
| EP-0435402-A2 | Resin composition based on a polyester resin, an amino resin and an epoxy resin | DSM N.V. (NL) | 1991-07-03 | — | — | EP | disclosed |