⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1810244 | 0.78 | — | — | |
| SCHEMBL1813174 | 0.74 | HSD17B10 (0.33) | — | |
| SCHEMBL1813175 | 0.74 | HSD17B10 (0.33) | — | |
| SCHEMBL1810915 | 0.74 | — | — | |
| SCHEMBL5873321 | 0.67 | — | — | |
| SCHEMBL1812616 | 0.65 | — | — | |
| SCHEMBL7535047 | 0.64 | — | — | |
| SCHEMBL28325305 | 0.63 | HSD17B10 (0.32) | — | |
| SCHEMBL5873317 | 0.62 | — | — | |
| SCHEMBL7537389 | 0.61 | EPHX1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6476240-B2 | POLYMERS DERIVED FROM AN UNSATURATED FUSED CYCLIC HYDROCARBON (SUCH AS PERHYDRO-2,3-DIDEHYDRO-1,4:5,8-DIMETHANONAPHTHALENE) JOINED BY A LINKER TO AN ESTER GROUP HAVING ONE OR TWO PROTECTED HYDROXYLS; USE AS PHOTORESIST | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2002-11-05 | — | — | US | disclosed |
| US-20020042531-A1 | Polymers derived from an unsaturated fused cyclic hydrocarbon (such as perhydro-2,3-didehydro-1,4:5,8-dimethanonaphthalene) joined by a linker to an ester group having one or two protected hydroxyls; use as photoresist | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2002-04-11 | — | — | US | disclosed |
| US-6331602-B1 | Monomer and a polymer obtained therefrom | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2001-12-18 | — | — | US | disclosed |
| US-6160068-A | Monomer and a polymer obtained therefrom | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2000-12-12 | — | — | US | disclosed |
| US-6143472-A | Resist composition and a method for formation of a pattern using the composition | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2000-11-07 | — | — | US | disclosed |
| EP-0918048-A1 | A novel monomer and a polymer obtained therefrom | Wako Pure Chemical Industries, Ltd. (JP) | 1999-05-26 | — | — | EP | disclosed |