SCHEMBL7543889

SCHEMBL7543889

C=C(CCCCCC(C)O)C(=O)O

nearest known ligand 0.40

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
FFAR1 O14842 2/20 0.40
FFAR4 Q5NUL3 1/20 0.40
TBXAS1 P24557 2/20 0.39
TET2 Q6N021 4/20 0.38
ALDH1A1 P00352 3/20 0.38
TET3 O43151 1/20 0.38
TET1 Q8NFU7 1/20 0.38
MAPT P10636 1/20 0.38
FAAH O00519 1/20 0.36
GPR84 Q9NQS5 3/20 0.35
LTA4H P09960 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4581374 1.00 FFAR1 (0.40) FFAR1FFAR4TBXAS1TET2ALDH1A1
SCHEMBL2486065 0.98 TET2 (0.39) FFAR1FFAR4TBXAS1TET2ALDH1A1
SCHEMBL148011 0.92 TET2 (0.40) FFAR4TBXAS1TET2ALDH1A1TET3
SCHEMBL920756 0.86 KDM4C (0.47) FFAR1FFAR4TBXAS1TET2ALDH1A1
SCHEMBL14936541 0.86 KDM4C (0.47) FFAR1FFAR4TBXAS1TET2ALDH1A1
SCHEMBL10788708 0.86 KDM4C (0.47) FFAR1FFAR4TBXAS1TET2ALDH1A1
SCHEMBL138197 0.86 KDM4C (0.47) FFAR1FFAR4TBXAS1TET2ALDH1A1
SCHEMBL24391 0.86 KDM4C (0.47) FFAR1FFAR4TBXAS1TET2ALDH1A1
SCHEMBL8647496 0.86 KDM4C (0.47) FFAR1FFAR4TBXAS1TET2ALDH1A1
SCHEMBL1026046 0.86 KDM4C (0.47) FFAR1FFAR4TBXAS1TET2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3233791-B1 MOISTURE STABLE HOLOGRAPHIC MEDIA COVESTRO DEUTSCHLAND AG (DE) 2020-08-12 EP disclosed
EP-3233791-A1 MOISTURE-STABLE HOLOGRAPHIC MEDIA Covestro Deutschland AG (DE) 2017-10-25 EP disclosed
WO-2016096641-A1 MOISTURE-STABLE HOLOGRAPHIC MEDIA COVESTRO DEUTSCHLAND AG (DE) 2016-06-23 WO disclosed
EP-0802194-B1 Novel thiouracil derivatives and metal surface-treating agent comprising thereof TOKUYAMA CORP (JP) 2002-06-19 EP disclosed
US-5795497-A Thiouracil derivatives and metal surface-treating agent comprising thereof TOKUYAMA CORPORATION (JP) 1998-08-18 US disclosed
EP-0802194-A2 Novel thiouracil derivatives and metal surface-treating agent comprising thereof TOKUYAMA CORPORATION (JP) 1997-10-22 EP disclosed
EP-0376021-B1 Styrene-based resin composite material and use thereof IDEMITSU PETROCHEMICAL CO (JP) 1996-04-24 EP disclosed
US-5273830-A Magnetic recording medium comprising a syndiotactic styrene-based polymer substrate, a magnetic layer and a backcoat lubricating layer each layer containing a curable phosphazine compound IDEMITSU PETROCHEMICAL CO., LTD. (JP) 1993-12-28 US disclosed
US-5082717-A Lubricating layer of a curable phosphazene compound IDEMITSU PETROCHEMICAL CO., LTD. (JP) 1992-01-21 US disclosed
EP-0376021-A2 Styrene-based resin composite material and use thereof IDEMITSU PETROCHEMICAL CO., LTD. (JP) 1990-07-04 EP disclosed
US-4057523-A MELAMINE OR GUANAMINE RESIN AMERICAN CYANAMID COMPANY (US) 1977-11-08 US disclosed
US-4026855-A Composition of matter particularly adaptable for use in electrodepositing films on metal AMERICAN CYANAMID COMPANY (US) 1977-05-31 US disclosed
US-3959202-A Composition of matter comprising a blend of certain polyether polyols, certain vinyl emulsion polymers and an aminoplast cross-linking agent AMERICAN CYANAMID COMPANY (US) 1976-05-25 US disclosed
US-3945961-A Novel cross-linking agents and their use in electrophoretic coating composition AMERICAN CYANAMID COMPANY (US) 1976-03-23 US disclosed