Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 6/20 | 0.70 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.70 |
| ▸ | TP53 | P04637 | 3/20 | 0.70 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.70 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.70 |
| ▸ | THRB | P10828 | 2/20 | 0.53 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.48 |
| ▸ | HPGD | P15428 | 1/20 | 0.44 |
| ▸ | LPAR3 | Q9UBY5 | 8/20 | 0.42 |
| ▸ | LPAR2 | Q9HBW0 | 6/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | LPAR1 | Q92633 | 4/20 | 0.33 |
| ▸ | TPI1 | P60174 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7550678 | 1.00 | TSHR (0.70) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL31250038 | 1.00 | TSHR (0.70) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL40905 | 0.94 | TSHR (0.59) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL28358338 | 0.92 | TSHR (0.57) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| Ethylene SCHEMBL2326264 | 0.92 | TSHR (0.57) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL141812 | 0.92 | TSHR (0.57) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| Propene SCHEMBL2319587 | 0.89 | TSHR (0.53) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| Acrylic Acid SCHEMBL30511187 | 0.89 | TSHR (0.53) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL7551992 | 0.89 | TSHR (0.70) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL7551686 | 0.89 | TSHR (0.70) | TSHRALDH1A1TP53HIF1AHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117813552-A | Photosensitive composition for pattern formation and flexographic plate | 日本瑞翁株式会社 | 2024-04-02 | — | — | CN | disclosed |
| CN-110244513-B | Colored photosensitive composition, black photo spacer and color filter | 三菱化学株式会社 | 2022-10-14 | — | — | CN | disclosed |
| US-8541063-B2 | Undercoat solution, ink-jet recording method and ink-jet recording device | FUJIFILM CORPORATION (JP) | 2013-09-24 | — | — | US | disclosed |
| EP-0784232-B1 | PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE RUBBER PLATE | NIPPON ZEON CO (JP) | 2002-09-04 | — | — | EP | disclosed |
| EP-0740214-B1 | Photosensitive composition and photosensitive rubber plate | ZEON CORP (JP) | 2002-07-10 | — | — | EP | disclosed |
| EP-0699961-B1 | PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE RUBBER PLATE AND PROCESS FOR PRODUCING THE PLATE, AND FLEXOGRAPHIC PLATE AND PROCESS FOR PRODUCING THE PLATE | NIPPON ZEON CO (JP) | 2000-11-15 | — | — | EP | disclosed |
| US-6025098-A | LIGHT SENSITIVE ELEMENTS WITH POLYMERS | NIPPON ZEON CO., LTD (JP) | 2000-02-15 | — | — | US | disclosed |
| EP-0778297-B1 | Hydrophilic copolymer, process for producing same, photosensitive composition, and photosensitive rubber plate | NIPPON ZEON CO (JP) | 1999-07-14 | — | — | EP | disclosed |
| US-5889116-A | BLEND OF AN ELASTOMER, HYDROPHILIC COPOLYMER AND PHOTOINITIATORS | NIPPON ZEON CO., LTD. (JP) | 1999-03-30 | — | — | US | disclosed |
| US-5863704-A | BLENDS OF DIENE-AROMATIC VINYL COPOLYMER BLOCKS, PHOTOPOLYMERIZABLE ETHYLENICALLY UNSATURATED MONOMER AND PHOTOINITIATOR | NIPPON ZEON COMPANY, LTD. (JP) | 1999-01-26 | — | — | US | disclosed |
| US-5830621-A | BLEND OF HYDROPHILIC GROUP-FREE BLOCK POLYMER AND HYDROPHILIC GROUP-CONTAINING RANDOM POLYMER, POLYOL ACRYLATE | NIPPON ZEON CO., LTD. (JP) | 1998-11-03 | — | — | US | disclosed |
| US-5679485-A | CURABLE ELASTIC BLEND CONTAINING HYDROPHOBIC ADDITION POLYMER HAVING PENDANT HYDROPHILIC PHOSPHATE GROUPS; AQUEOUS DEVELOPMENT OF IMAGE | NIPPON ZEON CO., LTD. (JP) | 1997-10-21 | — | — | US | disclosed |
| EP-0786700-A1 | PHOTOSENSITIVE ELASTOMER COMPOSITION AND PHOTOSENSITIVE RUBBER PRINTING PLATE | NIPPON ZEON CO., LTD. (JP) | 1997-07-30 | — | — | EP | disclosed |
| EP-0784232-A1 | PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE RUBBER PLATE | NIPPON ZEON CO., LTD. (JP) | 1997-07-16 | — | — | EP | disclosed |
| EP-0778297-A1 | Hydrophilic copolymer, process for producing same, photosensitive composition, and photosensitive rubber plate | NIPPON ZEON CO., LTD. (JP) | 1997-06-11 | — | — | EP | disclosed |
| EP-0751433-A2 | Release composition and photosensitive rubber plate with layer of the same | NIPPON ZEON CO., LTD. (JP) | 1997-01-02 | — | — | EP | disclosed |
| EP-0740214-A2 | Photosensitive composition and photosensitive rubber plate | NIPPON ZEON CO., LTD. (JP) | 1996-10-30 | — | — | EP | disclosed |
| EP-0699961-A1 | PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE RUBBER PLATE AND PROCESS FOR PRODUCING THE PLATE, AND FLEXOGRAPHIC PLATE AND PROCESS FOR PRODUCING THE PLATE | NIPPON ZEON CO., LTD. (JP) | 1996-03-06 | — | — | EP | disclosed |
| US-4576793-A | MULTILAYER, POROSITY, SPREADING, UNSATURATED ACID COPOLYMEWR | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1986-03-18 | — | — | US | disclosed |
| US-4407938-A | TEMPORARY BARRIER ALYER | KONISHIROKU PHOTO IND. CO., LTD. (JP) | 1983-10-04 | — | — | US | disclosed |