SCHEMBL7559853

SCHEMBL7559853

N#C/C=C/CCCCCCCCCCCCCCC#N

nearest known ligand 0.42

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
EPAS1 Q99814 7/20 0.42
HIF1A Q16665 6/20 0.42
TSHR P16473 1/20 0.35
ALDH1A1 P00352 3/20 0.33
TDP1 Q9NUW8 1/20 0.32
HMGCR P04035 2/20 0.32
MAPT P10636 1/20 0.31
GBA1 P04062 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23389002 1.00 EPAS1 (0.42) EPAS1HIF1ATSHRALDH1A1TDP1
SCHEMBL29066905 1.00 EPAS1 (0.42) EPAS1HIF1ATSHRALDH1A1TDP1
SCHEMBL7559857 1.00 EPAS1 (0.42) EPAS1HIF1ATSHRALDH1A1TDP1
SCHEMBL23388978 1.00 EPAS1 (0.42) EPAS1HIF1ATSHRALDH1A1TDP1
SCHEMBL30335098 1.00 EPAS1 (0.42) EPAS1HIF1ATSHRALDH1A1TDP1
SCHEMBL23389001 1.00 EPAS1 (0.42) EPAS1HIF1ATSHRALDH1A1TDP1
SCHEMBL23389003 1.00 EPAS1 (0.42) EPAS1HIF1ATSHRALDH1A1TDP1
SCHEMBL2473678 0.98 HIF1A (0.40) EPAS1HIF1ATSHRALDH1A1TDP1
SCHEMBL2473677 0.98 HIF1A (0.40) EPAS1HIF1ATSHRALDH1A1TDP1
SCHEMBL9721854 0.90

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109557764-B Chemically amplified positive photosensitive resin composition, resist pattern, method for forming the same, and electronic device 奇美实业股份有限公司 2023-09-12 CN claimed
US-4217299-A Method for converting unsaturated compound having functional group JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1980-08-12 US claimed
US-3974196-A Method for disproportionating ethylenically unsaturated compounds having functional ester groups JAPAN SYNTHETIC RUBBER CO., LTD. (JA) 1976-08-10 US claimed
CN-109557764-B Chemically amplified positive photosensitive resin composition, resist pattern, method for forming the same, and electronic device 奇美实业股份有限公司 2023-09-12 CN disclosed
EP-0626402-B1 Linear telechelic difunctional polymers and process for their preparation. CALIFORNIA INST OF TECHN (US) 2002-07-31 EP disclosed
US-5731383-A USED FOR HIGH DENSITY POLYESTERS, POLYAMIDES, POLYUREAS, POLYURETHANES AMOCO CORPORATION (US) 1998-03-24 US disclosed
US-5589548-A Process for preparing difunctional telechelic linear non-crosslinked polyolefins AMOCO CORPORATION (US) 1996-12-31 US disclosed
US-5559190-A Difunctional telechelic linear non-crosslinked polyolefins AMOCO CORPORATION (US) 1996-09-24 US disclosed
US-5512635-A OLEFIN METATHESIS PROCESS; CROSSLINKING INHIBITION AMOCO CORPORATION (US) 1996-04-30 US disclosed
US-5403904-A Process for preparation of telechelic difunctional unsaturated oligomers or polymers by acyclic olefin metathesis AMOCO CORPORATION (US) 1995-04-04 US disclosed
EP-0626402-A2 Process for preparing linear monofunctional and telechelic difunctional polymers and compositions obtained thereby AMOCO CORPORATION (US) 1994-11-30 EP disclosed
US-4217299-A Method for converting unsaturated compound having functional group JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1980-08-12 US disclosed
US-3974196-A Method for disproportionating ethylenically unsaturated compounds having functional ester groups JAPAN SYNTHETIC RUBBER CO., LTD. (JA) 1976-08-10 US disclosed