⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL676835 | 1.00 | TSHR (0.32) | — | |
| SCHEMBL3271432 | 1.00 | TSHR (0.32) | — | |
| SCHEMBL7554950 | 0.94 | — | — | |
| SCHEMBL7934771 | 0.86 | — | — | |
| SCHEMBL1929406 | 0.81 | — | — | |
| Hydrochloric Acid SCHEMBL31706459 | 0.79 | — | — | |
| SCHEMBL523741 | 0.79 | — | — | |
| SCHEMBL4187235 | 0.78 | PTPN1 (0.32) | — | |
| SCHEMBL9397884 | 0.77 | — | — | |
| SCHEMBL303459 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1500978-B1 | Photosensitive metal nanoparticle and method of forming conductive pattern using the same | SAMSUNG ELECTRONICS CO LTD (KR) | 2014-04-23 | — | — | EP | claimed |
| US-8288130-B2 | Polypeptide cleavage process | MEDTRONIC, INC. (US) | 2012-10-16 | — | — | US | claimed |
| EP-1532142-B1 | POLYPEPTIDE CLEAVAGE PROCESS | MEDTRONIC INC (US) | 2012-03-21 | — | — | EP | claimed |
| US-7923110-B2 | Metal nanoparticle having a self-assembled monolayer on its surface, and formation of conductive pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-04-12 | — | — | US | claimed |
| US-20100311947-A1 | POLYPEPTIDE CLEAVAGE PROCESS | MEDTRONIC, INC. (US) | 2010-12-09 | — | — | US | claimed |
| EP-1531836-B1 | POLYPEPTIDE CLEAVAGE PROCESS | MEDTRONIC INC (US) | 2010-11-10 | — | — | EP | claimed |
| US-7771966-B2 | Polypeptide cleavage process | MEDTRONIC, INC. (US) | 2010-08-10 | — | — | US | claimed |
| CN-1573543-B | Photosensitive metal nanoparticle and method of forming conductive pattern using the same | SAMSUNG ELECTRONICS CO LTD | 2010-05-12 | — | — | CN | claimed |
| US-7592432-B2 | selectively splitting the polypeptide at a Cys-His site, by hydrolysis in presence of a palladium promotor dissolved in formic acid; purification with by-product inhibition | RESTORAGEN, INC. (US) | 2009-09-22 | — | — | US | claimed |
| US-7473513-B1 | Photosensitive metal nanoparticle and method of forming conductive pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-01-06 | — | — | US | claimed |
| EP-1532142-A2 | POLYPEPTIDE CLEAVAGE PROCESS | Restoragen, Inc. (US) | 2005-05-25 | — | — | EP | claimed |
| CN-1573543-A | Photosensitive metal nanoparticle and method of forming conductive pattern using the same | SAMSUNG ELECTRONICS CO LTD (KR) | 2005-02-02 | — | — | CN | claimed |
| EP-1500978-A2 | Photosensitive metal nanoparticle and method of forming conductive pattern using the same | Samsung Electronics Co., Ltd. (KR) | 2005-01-26 | — | — | EP | claimed |
| US-20040253536-A1 | Photosensitive metal nanoparticle and method of forming conductive pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-12-16 | — | — | US | claimed |
| WO-2003100015-A2 | POLYPEPTIDE CLEAVAGE PROCESS | RESTORAGEN, INC. (US) | 2003-12-04 | — | — | WO | claimed |
| EP-0743574-B1 | Migration imaging members | XEROX CORP (US) | 2000-12-27 | — | — | EP | claimed |
| EP-0743573-B1 | Method for obtaining image contrast migration imaging members | XEROX CORP (US) | 2000-09-06 | — | — | EP | claimed |
| EP-0743573-A2 | Method for obtaining image contrast migration imaging members | XEROX CORPORATION (US) | 1996-11-20 | — | — | EP | claimed |
| US-5563014-A | SOFTENABLE LAYER CONTAINIG PHOTOSENSITIVE MARKING MATERIAL; TRANSPARENTIZING AGENT | XEROX CORPORATION (US) | 1996-10-08 | — | — | US | claimed |
| US-5514505-A | SELECTIVE TRANSPARENTIZATION OF PHOTOSENSITIVE MIGRATION MARKING PARTICLES EMBEDDED NEAR THE SURFACE OF A SOFTENABLE LAYER SUPPORTED BY AN ELECTROCONDUCTIVE SUBSTRATE | XEROX CORPORATION (US) | 1996-05-07 | — | — | US | claimed |