Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPBAR1 | Q8TDU6 | 7/20 | 1.00 |
| ▸ | EPHA2 | P29317 | 4/20 | 1.00 |
| ▸ | CASP7 | P55210 | 3/20 | 1.00 |
| ▸ | VDR | P11473 | 3/20 | 1.00 |
| ▸ | HIF1A | Q16665 | 3/20 | 1.00 |
| ▸ | TP53 | P04637 | 2/20 | 1.00 |
| ▸ | MAPK1 | P28482 | 2/20 | 1.00 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 1.00 |
| ▸ | BLM | P54132 | 2/20 | 1.00 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 1.00 |
| ▸ | USP2 | O75604 | 2/20 | 1.00 |
| ▸ | CYP3A4 | P08684 | 2/20 | 1.00 |
| ▸ | NR1H4 | Q96RI1 | 2/20 | 1.00 |
| ▸ | LMNA | P02545 | 2/20 | 1.00 |
| ▸ | MDM4 | O15151 | 1/20 | 1.00 |
| ▸ | MAPT | P10636 | 1/20 | 1.00 |
| ▸ | HSPD1 | P10809 | 1/20 | 1.00 |
| ▸ | TSHR | P16473 | 1/20 | 1.00 |
| ▸ | PTPN2 | P17706 | 1/20 | 1.00 |
| ▸ | PTPN1 | P18031 | 1/20 | 1.00 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Lithocholic Acid SCHEMBL22756077 | 1.00 | GPBAR1 (1.00) | GPBAR1EPHA2CASP7VDRHIF1A | |
| Lithocholic Acid SCHEMBL22894393 | 1.00 | GPBAR1 (1.00) | GPBAR1EPHA2CASP7VDRHIF1A | |
| Lithocholic Acid SCHEMBL22871939 | 1.00 | GPBAR1 (1.00) | GPBAR1EPHA2CASP7VDRHIF1A | |
| Lithocholic Acid SCHEMBL22079173 | 1.00 | GPBAR1 (1.00) | GPBAR1EPHA2CASP7VDRHIF1A | |
| Lithocholic Acid SCHEMBL24001494 | 1.00 | GPBAR1 (1.00) | GPBAR1EPHA2CASP7VDRHIF1A | |
| Lithocholic Acid SCHEMBL22894425 | 1.00 | GPBAR1 (1.00) | GPBAR1EPHA2CASP7VDRHIF1A | |
| Lithocholic Acid SCHEMBL23923735 | 1.00 | GPBAR1 (1.00) | GPBAR1EPHA2CASP7VDRHIF1A | |
| Lithocholic Acid SCHEMBL24001453 | 1.00 | GPBAR1 (1.00) | GPBAR1EPHA2CASP7VDRHIF1A | |
| Lithocholic Acid SCHEMBL24567422 | 1.00 | GPBAR1 (1.00) | GPBAR1EPHA2CASP7VDRHIF1A | |
| Lithocholic Acid SCHEMBL22415871 | 1.00 | GPBAR1 (1.00) | GPBAR1EPHA2CASP7VDRHIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 257 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090258847-A1 | Cholanic Acid Amides | NOVARTIS AG (CH) | 2009-10-15 | — | — | US | claimed |
| EP-2044100-A2 | SULPHONYLAMINOCARBONYL DERIVATIVES OF BILE ACID AMIDES FOR USE AS IMMUNOMODULATORS | Novartis AG (CH) | 2009-04-08 | — | — | EP | claimed |
| WO-2008009407-A2 | SULPHONYLAMINOCARBONYL DERIVATIVES OF BILE ACID AMIDES FOR USE AS IMMUNOMODULATORS | NOVARTIS AG (CH) | 2008-01-24 | — | — | WO | claimed |
| US-20230322689-A1 | IONIZABLE LIPID COMPOUNDS AND LIPID NANOPARTICLE COMPOSITIONS | SunVax mRNA Therapeutics Inc. (US) | 2023-10-12 | — | — | US | disclosed |
| WO-2023196527-A2 | IONIZABLE LIPID COMPOUNDS AND LIPID NANOPARTICLE COMPOSITIONS | SunVax mRNA Therapeutics Inc. (US) | 2023-10-12 | — | — | WO | disclosed |
| US-20230322689-A1 | IONIZABLE LIPID COMPOUNDS AND LIPID NANOPARTICLE COMPOSITIONS | SunVax mRNA Therapeutics Inc. (US) | 2023-10-12 | — | — | US | disclosed |
| EP-2000851-B1 | Photomask blank, resist pattern forming process, and photomask preparation process | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| US-8968979-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8968979-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-03 | — | — | US | disclosed |
| EP-2081084-B1 | Positive resist compositions and patterning process | SHINETSU CHEMICAL CO (JP) | 2014-12-24 | — | — | EP | disclosed |
| US-8795942-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-05 | — | — | US | disclosed |
| US-7211367-B2 | Photo acid generator, chemical amplification resist material | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-01 | — | — | US | disclosed |
| US-20070072115-A1 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-29 | — | — | US | disclosed |
| US-20070072115-A1 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-29 | — | — | US | disclosed |
| US-7189493-B2 | Polymer, positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| US-7189493-B2 | Polymer, positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| US-7169541-B2 | Compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-30 | — | — | US | disclosed |
| US-7169541-B2 | Compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-30 | — | — | US | disclosed |
| US-7157207-B2 | Polymer, resist material and patterning processing | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7157207-B2 | Polymer, resist material and patterning processing | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090258847-A1 | Cholanic Acid Amides | NR1H4, SLC10A1, CYP46A1 | GPBAR1 5/4885EPHA2 2665/4885CASP7 1664/4885 |
| US-20230322689-A1 | IONIZABLE LIPID COMPOUNDS AND LIPID NANOPARTICLE COMPOSITIONS | PHOSPHO1, SGMS1, PLIN3 | GPBAR1 3094/4885EPHA2 1616/4885CASP7 3943/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.