SCHEMBL758606

SCHEMBL758606

COc1ccc([S+](c2ccccc2)c2ccccc2)cc1.F[B-](F)(F)F

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA4 P22748 1/20 0.50
LTA4H P09960 2/20 0.48
CA12 O43570 1/20 0.44
CA1 P00915 1/20 0.44
CA2 P00918 1/20 0.44
CA7 P43166 1/20 0.44
CA9 Q16790 1/20 0.44
CA14 Q9ULX7 1/20 0.44
TRPA1 O75762 1/20 0.44
ACHE P22303 2/20 0.42
NPC1 O15118 3/20 0.42
RAB9A P51151 3/20 0.42
ALDH1A1 P00352 2/20 0.42
KDM4E B2RXH2 1/20 0.42
LMNA P02545 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
CES2 O00748 1/20 0.41
CES1 P23141 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3137195 1.00 CA4 (0.50) CA4LTA4HCA12CA1CA2
SCHEMBL47490 0.92 CA4 (0.59) CA4LTA4HCA12CA1CA2
SCHEMBL2092493 0.92 CA4 (0.59) CA4LTA4HCA12CA1CA2
SCHEMBL1477263 0.92 CA1 (0.52) CA4LTA4HCA12CA1CA2
SCHEMBL4340775 0.92 CA4 (0.59) CA4LTA4HCA12CA1CA2
Bromide SCHEMBL3139583 0.90 CA4 (0.56) CA4LTA4HCA12CA1CA2
Bromide SCHEMBL3130102 0.90 CA4 (0.56) CA4LTA4HCA12CA1CA2
SCHEMBL30217936 0.88 CA4 (0.50) CA4LTA4HCA12CA1CA2
SCHEMBL30727545 0.88 CA4 (0.50) CA4LTA4HCA12CA1CA2
SCHEMBL3143783 0.85 CA4 (0.46) CA4LTA4HCA12CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 247 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250123567-A1 POLYSILOXANE COMPOSITION MERCK ELECTRONICS KGAA (DE) 2025-04-17 US disclosed
CN-119403882-A Polysiloxane composition 默克专利有限公司 2025-02-07 CN disclosed
CN-114341215-B Curable composition 株式会社日本触媒 2024-12-27 CN disclosed
US-20240352203-A1 FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE ADEKA CORPORATION (JP) 2024-10-24 US disclosed
CN-118725578-A Composition for black matrix and method for producing black matrix using same 默克专利有限公司 2024-10-01 CN disclosed
CN-111512230-B Photosensitive siloxane composition and pattern forming method using same 默克专利有限公司 2024-07-12 CN disclosed
EP-4375750-A1 FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE ADEKA CORPORATION (JP) 2024-05-29 EP disclosed
CN-117616337-A Film forming material for semiconductor, member forming material for semiconductor, process member forming material for semiconductor, underlayer film forming material, underlayer film, and semiconductor device 株式会社艾迪科 2024-02-27 CN disclosed
CN-110709773-B Positive photosensitive siloxane composition and cured film formed using same 默克专利有限公司 2024-02-09 CN disclosed
CN-110546566-B Positive photosensitive siloxane composition and cured film formed using same 默克专利有限公司 2024-02-09 CN disclosed
EP-1235104-A1 COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN JSR Corporation (JP) 2002-08-28 EP disclosed
US-20020055059-A1 Radiation sensitive resin composition, cathode separator and el display device JSR CORPORATION (JP) 2002-05-09 US disclosed
EP-1193557-A1 Use of a radiation sensitive resin composition for the formation of cathode separator, cathode separator and electroluminescent display device JSR Corporation (JP) 2002-04-03 EP disclosed
EP-0880075-B1 Radiation sensitive resin composition JSR CORP (JP) 2001-10-17 EP disclosed
US-5958648-A Radiation sensitive resin composition JSR CORPORATION (JP) 1999-09-28 US disclosed
US-5925484-A Black photosensitive resin composition, color filter made by using the same, and a process for the production thereof TOPPAN PRINTING CO., LTD. (JP) 1999-07-20 US disclosed
EP-0880075-A1 Radiation sensitive resin composition JSR Corporation (JP) 1998-11-25 EP disclosed
EP-0854169-A1 BLACK PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER MADE BY USING THE SAME, AND PROCESS FOR THE PRODUCTION THEREOF Toppan Printing Co., Ltd. (JP) 1998-07-22 EP disclosed
EP-0594452-B1 Radiation sensitive resin composition for microlens JAPAN SYNTHETIC RUBBER CO LTD (JP) 1997-01-15 EP disclosed
US-5432039-A Radiation sensitive quinone diazide and resin composition for microlens JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-07-11 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240352203-A1 FILM-FORMING MATERIAL FOR SEMICONDUCTOR, MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, PROCESS MEMBER-FORMING MATERIAL FOR SEMICONDUCTOR, UNDERLAYER FILM-FORMING MATERIAL, UNDERLAYER FILM, AND SEMICONDUCTOR DEVICE FBXL19, SRSF9, CNOT9 CA4 3423/4885LTA4H 3605/4885CA12 2317/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.