Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AKR1C3 | P42330 | 1/20 | 0.75 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.56 |
| ▸ | TSHR | P16473 | 1/20 | 0.56 |
| ▸ | HTT | P42858 | 1/20 | 0.55 |
| ▸ | RECQL | P46063 | 1/20 | 0.52 |
| ▸ | RAB9A | P51151 | 4/20 | 0.51 |
| ▸ | NPC1 | O15118 | 3/20 | 0.51 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.51 |
| ▸ | DHODH | Q02127 | 1/20 | 0.51 |
| ▸ | TRPM8 | Q7Z2W7 | 1/20 | 0.51 |
| ▸ | MEN1 | O00255 | 2/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.50 |
| ▸ | POLB | P06746 | 2/20 | 0.50 |
| ▸ | FBP1 | P09467 | 1/20 | 0.50 |
| ▸ | GLA | P06280 | 1/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | MAPT | P10636 | 1/20 | 0.50 |
| ▸ | PKM | P14618 | 1/20 | 0.49 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.49 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL759656 | 1.00 | AKR1C3 (0.75) | AKR1C3ALDH1A1TSHRHTTRECQL | |
| SCHEMBL4605738 | 0.91 | AKR1C3 (0.76) | AKR1C3ALDH1A1TSHRHTTRECQL | |
| SCHEMBL4605744 | 0.91 | AKR1C3 (0.76) | AKR1C3ALDH1A1TSHRHTTRECQL | |
| SCHEMBL14047500 | 0.87 | AKR1C3 (0.64) | AKR1C3ALDH1A1TSHRHTTRECQL | |
| SCHEMBL37034 | 0.86 | AKR1C3 (1.00) | AKR1C3ALDH1A1TSHRHTTRECQL | |
| SCHEMBL2532810 | 0.86 | AKR1C3 (0.75) | AKR1C3ALDH1A1TSHRHTTRECQL | |
| SCHEMBL41906 | 0.86 | AKR1C3 (1.00) | AKR1C3ALDH1A1TSHRHTTRECQL | |
| SCHEMBL805622 | 0.86 | AKR1C3 (0.75) | AKR1C3ALDH1A1TSHRHTTRECQL | |
| SCHEMBL874087 | 0.86 | AKR1C3 (0.75) | AKR1C3ALDH1A1TSHRHTTRECQL | |
| SCHEMBL16568719 | 0.86 | AKR1C3 (1.00) | AKR1C3ALDH1A1TSHRHTTRECQL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0067067-B1 | DRY-DEVELOPING NEGATIVE RESIST COMPOSITION | FUJITSU LIMITED (JP) | 1985-09-25 | — | — | EP | claimed |
| US-4464455-A | Dry-developing negative resist composition | FUJITSU LIMITED (JP) | 1984-08-07 | — | — | US | claimed |
| EP-0067067-A2 | Dry-developing negative resist composition | FUJITSU LIMITED (JP) | 1982-12-15 | — | — | EP | claimed |
| US-8815472-B2 | Volume hologram optical recording medium, composition for volume hologram recording layer formation, and volume hologram recording material | MITSUBISHI CHEMICAL CORPORATION (JP) | 2014-08-26 | — | — | US | disclosed |
| EP-2077471-B1 | VOLUME HOLOGRAM OPTICAL RECORDING MEDIUM, COMPOSITION FOR VOLUME HOLOGRAM RECORDING LAYER FORMATION, AND VOLUME HOLOGRAM RECORDING MATERIAL | MITSUBISHI CHEM CORP (JP) | 2012-07-25 | — | — | EP | disclosed |
| EP-2063324-B1 | VOLUME HOLOGRAM OPTICAL RECORDING MEDIUM, COMPOSITION FOR FORMING VOLUME HOLOGRAM RECORDING LAYER, VOLUME HOLOGRAM RECORDING MATERIAL, AND VOLUME HOLOGRAM OPTICAL RECORDING METHOD | MITSUBISHI CHEM CORP (JP) | 2012-03-21 | — | — | EP | disclosed |
| US-20100067073-A1 | VOLUME HOLOGRAM OPTICAL RECORDING MEDIUM, COMPOSITION FOR VOLUME HOLOGRAM RECORDING LAYER FORMATION, AND VOLUME HOLOGRAM RECORDING MATERIAL | MITSUBISHI CHEMICAL CORPORATION (JP) | 2010-03-18 | — | — | US | disclosed |
| US-20100039685-A1 | VOLUME HOLOGRAM OPTICAL RECORDING MEDIUM, COMPOSITION FOR FORMING VOLUME HOLOGRAM RECORDING LAYER, VOLUME HOLOGRAM RECORDING MATERIAL, AND VOLUME HOLOGRAM OPTICAL RECORDING METHOD | MITSUBISHI CHEMICAL CORPORATION (JP) | 2010-02-18 | — | — | US | disclosed |
| EP-2077471-A1 | VOLUME HOLOGRAM OPTICAL RECORDING MEDIUM, COMPOSITION FOR VOLUME HOLOGRAM RECORDING LAYER FORMATION, AND VOLUME HOLOGRAM RECORDING MATERIAL | Mitsubishi Chemical Corporation (JP) | 2009-07-08 | — | — | EP | disclosed |
| EP-2063324-A1 | VOLUME HOLOGRAM OPTICAL RECORDING MEDIUM, COMPOSITION FOR FORMING VOLUME HOLOGRAM RECORDING LAYER, VOLUME HOLOGRAM RECORDING MATERIAL, AND VOLUME HOLOGRAM OPTICAL RECORDING METHOD | Mitsubishi Chemical Corporation (JP) | 2009-05-27 | — | — | EP | disclosed |
| US-7368224-B2 | High photosensitivity, visible laser recording materials; comprised of novel squarylium compound metal complexes, free radical generators and monomers | KYOWA HAKKO CHEMICAL CO., LTD. (JP) | 2008-05-06 | — | — | US | disclosed |
| EP-0573023-B1 | Method for manufacturing liquid jet recording head | CANON KK (JP) | 1998-12-30 | — | — | EP | disclosed |
| US-5458254-A | Method for manufacturing liquid jet recording head | CANON KABUSHIKI KAISHA (JP) | 1995-10-17 | — | — | US | disclosed |
| EP-0573023-A1 | Method for manufacturing liquid jet recording head | CANON KABUSHIKI KAISHA (JP) | 1993-12-08 | — | — | EP | disclosed |
| EP-0140240-B1 | PROCESS FOR FORMING AN ORGANIC THIN FILM | HITACHI, LTD. (JP) | 1988-07-06 | — | — | EP | disclosed |
| US-4604294-A | VACUUM VAPOR DEPOSITION | HITACHI, LTD. (JP) | 1986-08-05 | — | — | US | disclosed |
| EP-0067067-B1 | DRY-DEVELOPING NEGATIVE RESIST COMPOSITION | FUJITSU LIMITED (JP) | 1985-09-25 | — | — | EP | disclosed |
| EP-0140240-A1 | Process for forming an organic thin film | HITACHI, LTD. (JP) | 1985-05-08 | — | — | EP | disclosed |
| US-4464455-A | Dry-developing negative resist composition | FUJITSU LIMITED (JP) | 1984-08-07 | — | — | US | disclosed |
| EP-0067067-A2 | Dry-developing negative resist composition | FUJITSU LIMITED (JP) | 1982-12-15 | — | — | EP | disclosed |