Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPBAR1 | Q8TDU6 | 7/20 | 0.71 |
| ▸ | CYP3A4 | P08684 | 4/20 | 0.71 |
| ▸ | NR1H4 | Q96RI1 | 4/20 | 0.71 |
| ▸ | PDE3A | Q14432 | 2/20 | 0.71 |
| ▸ | LMNA | P02545 | 2/20 | 0.66 |
| ▸ | ABCB11 | O95342 | 3/20 | 0.59 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.58 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.58 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.58 |
| ▸ | MEN1 | O00255 | 3/20 | 0.58 |
| ▸ | SLCO1B3 | Q9NPD5 | 1/20 | 0.58 |
| ▸ | SLCO1B1 | Q9Y6L6 | 1/20 | 0.58 |
| ▸ | USP2 | O75604 | 1/20 | 0.58 |
| ▸ | SLC10A2 | Q12908 | 3/20 | 0.56 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.56 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.56 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.56 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.56 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.56 |
| ▸ | SLC10A1 | Q14973 | 1/20 | 0.56 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Glutarate SCHEMBL2071417 | 0.97 | GPBAR1 (0.68) | GPBAR1CYP3A4NR1H4PDE3ALMNA | |
| SCHEMBL1147290 | 0.91 | GPBAR1 (0.78) | GPBAR1CYP3A4NR1H4PDE3ALMNA | |
| SCHEMBL16252975 | 0.91 | GPBAR1 (0.78) | GPBAR1CYP3A4NR1H4PDE3ALMNA | |
| SCHEMBL1492131 | 0.91 | GPBAR1 (0.78) | GPBAR1CYP3A4NR1H4PDE3ALMNA | |
| SCHEMBL1654286 | 0.91 | GPBAR1 (0.78) | GPBAR1CYP3A4NR1H4PDE3ALMNA | |
| SCHEMBL19650372 | 0.91 | GPBAR1 (0.78) | GPBAR1CYP3A4NR1H4PDE3ALMNA | |
| SCHEMBL16241720 | 0.91 | GPBAR1 (0.78) | GPBAR1CYP3A4NR1H4PDE3ALMNA | |
| SCHEMBL29459591 | 0.91 | GPBAR1 (0.78) | GPBAR1CYP3A4NR1H4PDE3ALMNA | |
| SCHEMBL18424160 | 0.88 | GPBAR1 (0.74) | GPBAR1CYP3A4NR1H4PDE3ALMNA | |
| SCHEMBL16057839 | 0.88 | GPBAR1 (0.74) | GPBAR1CYP3A4NR1H4PDE3ALMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7670748-B2 | Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-03-02 | — | — | US | claimed |
| US-20070141511-A1 | Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-06-21 | — | — | US | claimed |
| EP-1625447-B1 | PHOTOACID GENERATORS WITH PERFLUORINATED MULTIFUNCTIONAL ANIONS | 3M INNOVATIVE PROPERTIES CO (US) | 2014-04-23 | — | — | EP | disclosed |
| EP-1556740-B1 | IONIC PHOTOACID GENERATORS WITH SEGMENTED HYDROCARBON-FLUOROCARBON SULFONATE ANIONS | 3M INNOVATIVE PROPERTIES CO (US) | 2012-03-21 | — | — | EP | disclosed |
| US-7670748-B2 | Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-03-02 | — | — | US | disclosed |
| US-7615337-B2 | Photoactive resist capping layer | INTEL CORPORATION (US) | 2009-11-10 | — | — | US | disclosed |
| US-20070141511-A1 | Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-06-21 | — | — | US | disclosed |
| US-7122294-B2 | Photoacid generators with perfluorinated multifunctional anions | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2006-10-17 | — | — | US | disclosed |
| US-7078444-B2 | Ionic photoacid generators with segmented hydrocarbonfluorocarbon sulfonate anions | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2006-07-18 | — | — | US | disclosed |
| US-20060046206-A1 | Photoactive resist capping layer | INTEL CORPORATION | 2006-03-02 | — | — | US | disclosed |
| EP-0907109-B1 | Process for device fabrication using a radiation-sensitive resist material | LUCENT TECHNOLOGIES INC (US) | 2005-11-16 | — | — | EP | disclosed |
| EP-1035437-B1 | A radiation-sensitive resist material and a process for device fabrication using the same | LUCENT TECHNOLOGIES INC (US) | 2002-03-27 | — | — | EP | disclosed |
| US-6296984-B1 | PHOTORESISTS LIGHT SENSITIVE LAYERS ON A SUBSTRATE WITH CHROMOPHORE OF IODINIUM AND SULFONIUM GROUPS | AGERE SYSTEMS GUARDIAN CORP. | 2001-10-02 | — | — | US | disclosed |
| EP-1130469-A1 | A radiation-sensitive resist material and a process for device fabrication using the same | LUCENT TECHNOLOGIES INC. (US) | 2001-09-05 | — | — | EP | disclosed |
| US-6258508-B1 | PHOTORESISTS | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2001-07-10 | — | — | US | disclosed |
| EP-1035437-A2 | A radiation-sensitive resist material and a process for device fabrication using the same | LUCENT TECHNOLOGIES INC. (US) | 2000-09-13 | — | — | EP | disclosed |
| US-6013413-A | Alicyclic nortricyclene polymers and co-polymers | CORNELL RESEARCH FOUNDATION, INC. (US) | 2000-01-11 | — | — | US | disclosed |
| US-5998099-A | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1999-12-07 | — | — | US | disclosed |
| EP-0907109-A1 | Process for device fabrication using a radiation-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1999-04-07 | — | — | EP | disclosed |
| US-5879857-A | POLYMER, PHOTOACID GENERATOR, DISSOLUTION INHIBITOR | LUCENT TECHNOLOGIES INC. (US) | 1999-03-09 | — | — | US | disclosed |