SCHEMBL760080

SCHEMBL760080

CN1CN(C)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12712313 1.00
SCHEMBL113547 1.00
SCHEMBL4446841 0.94
Ammonia Solution, Strong SCHEMBL28127007 0.94
Hydrochloric Acid SCHEMBL3959240 0.89
Hydrochloric Acid SCHEMBL1071751 0.89
Methylamine SCHEMBL26108259 0.89
SCHEMBL18157901 0.85 CYP1A2 (0.33)
Dimethylamine SCHEMBL9478546 0.85
SCHEMBL1074174 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 80 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116333294-B Catalyst for preparing block polyether and preparation method of block polyether 辽宁奥克药业股份有限公司 2023-12-29 CN claimed
US-20240207267-A1 (R)-Glutarimide CRBN Ligands and Methods of Use BEIGENE SWITZERLAND GMBH (CH) 2024-06-27 US disclosed
EP-4328225-A1 HETEROCYCLIC DERIVATIVE INHIBITOR AND PREPARATION METHOD THEREFOR AND APPLICATION THEREOF Shanghai Hansoh Biomedical Co., Ltd. (CN) 2024-02-28 EP disclosed
US-20240030062-A1 INTEGRATION OF FULLY ALIGNED VIA THROUGH SELECTIVE DEPOSITION AND RESISTIVITY REDUCTION LAM RESEARCH CORPORATION 2024-01-25 US disclosed
US-20240025902-A1 BIFUNCTIONAL COMPOUNDS FOR DEGRADATION OF EGFR AND RELATED METHODS OF USE BEONE MEDICINES I GMBH (CH) 2024-01-25 US disclosed
CN-116333294-B Catalyst for preparing block polyether and preparation method of block polyether 辽宁奥克药业股份有限公司 2023-12-29 CN disclosed
US-20230265116-A1 DEGRADATION OF (EGFR) BY CONJUGATION OF EGFR INHIBITORS WITH E3 LIGASE LIGAND AND METHODS OF USE BEONE MEDICINES I GMBH (CH) 2023-08-24 US disclosed
US-20230265576-A1 Composition For Copper Electroplating On A Cobalt Seed BASF SE (DE) 2023-08-24 US disclosed
US-20230257372-A1 NOVEL COMPOUNDS AS HISTONE DEACETYLASE 6 INHIBITOR, AND PHARMACEUTICAL COMPOSITION COMPRISING THE SAME CHONG KUN DANG PHARMACEUTICAL CORP. (KR) 2023-08-17 US disclosed
US-20230248834-A1 DEGRADATION OF (EGFR) BY CONJUGATION OF EGFR INHIBITORS WITH E3 LIGASE LIGAND AND METHODS OF USE BEONE MEDICINES I GMBH (CH) 2023-08-10 US disclosed
US-20080153982-A1 Vinyl-Thiocarbonate and Polyol Containing Block Copolymers LUBRIZOL ADVANCED MATERIALS, INC. 2008-06-26 US disclosed
US-20080050995-A1 Hydroxyl-Terminated Thiocarbonate Containing Compounds, Polymers, and Copolymers, and Polyurethanes and Urethane Acrylics Made Therefrom LUBRIZOL ADVANCED MATERIALS, INC. 2008-02-28 US disclosed
US-7335788-B2 S-(α, α′-disubstituted-α″-acetic acid) substituted dithiocarbonate derivatives for controlled radical polymerizations, process and polymers made therefrom LUBRIZOL ADVANCED MATERIALS, INC. (US) 2008-02-26 US disclosed
US-7314699-B2 Radiation-sensitive mixture and recording material produced therewith AGFA GRAPHICS NV (BE) 2008-01-01 US disclosed
US-20070224543-A1 Photopolymer Printing Plate Precursor AGFA-GEVAERT (BE) 2007-09-27 US disclosed
US-7241557-B2 Printing plate precursor, sensitivity AGFA GRAPHICS NV (BE) 2007-07-10 US disclosed
US-7222650-B2 Tire with a tread comprising a rubbery polymer of a functionalized monomer THE GOODYEAR TIRE & RUBBER COMPANY (US) 2007-05-29 US disclosed
US-20070032564-A1 Binder, polymerizable compound, photoinitiator, and a sensitizer that is an optical brightener having a solubility in methyl ethyl ketone of at least 15 g/kg at 20 degrees C. that is a bis(3,5-dialkoxystyryl)-benzene or -biphenyl compound; printing plates without pinhole defects even after being stored AGFA-GEVAERT (BE) 2007-02-08 US disclosed
US-7172851-B2 Light sensitive composition, planographic printing plate material, and image formation method KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2007-02-06 US disclosed
US-7169535-B2 Photosensitive composition and photosensitive lithographic printing plate KONICA MINOLTA HOLDINGS, INC. (JP) 2007-01-30 US disclosed