SCHEMBL76068

SCHEMBL76068

C[Si]1(C)[Si](C)(C)[Si](C)(C)[Si]1(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL345763 1.00
SCHEMBL231164 1.00
SCHEMBL30989494 1.00
SCHEMBL29419920 0.45
SCHEMBL10769372 0.45
SCHEMBL29628015 0.45
SCHEMBL29732618 0.45
SCHEMBL5383540 0.45
SCHEMBL11138911 0.45 CA1 (0.50)
SCHEMBL9697682 0.45

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 302 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119194652-A Special material for spinning large-diameter polyphenyl ether monofilament as well as preparation method and application thereof 南通大学 2024-12-27 CN claimed
WO-2024131556-A1 HIGH-ADHESION CONDUCTIVE ADHESIVE, PREPARATION METHOD THEREFOR AND USE THEREOF 湖北亿纬动力有限公司 2024-06-27 WO claimed
US-11977007-B2 Gas detection device and gas detection method FIGARO ENGINEERING INC. (JP) 2024-05-07 US claimed
CN-117736633-A Anti-fouling color pavement anti-skid coating and preparation method and application thereof 山西省建筑科学研究院集团有限公司 2024-03-22 CN claimed
CN-117511223-A Active fire-extinguishing foam silica gel sheet and preparation method thereof 苏州铂韬新材料科技有限公司 2024-02-06 CN claimed
CN-116314788-A High-adhesion conductive adhesive, and preparation method and application thereof 湖北亿纬动力有限公司 2023-06-23 CN claimed
WO-2022247634-A1 BATTERY WITH COATING AND PREPARATION METHOD THEREFOR 江苏菲沃泰纳米科技股份有限公司 2022-12-01 WO claimed
CN-113584944-B White craft paper and preparation method thereof 浙江金龙再生资源科技股份有限公司 2022-11-01 CN claimed
CN-110242418-B High-performance gas turbine air intake system 江苏华强新能源科技有限公司 2022-04-01 CN claimed
CN-113717601-A Waterproof reflective heat-insulating coating and preparation method thereof 广东顺德三和化工有限公司 2021-11-30 CN claimed
US-20150079799-A1 METHOD FOR STABILIZING AN INTERFACE POST ETCH TO MINIMIZE QUEUE TIME ISSUES BEFORE NEXT PROCESSING STEP APPLIED MATERIALS INC (US) 2015-03-19 US claimed
US-20110052909-A1 DEVICE FOR THERMOHYDRAULIC APPLICATIONS WITH IMPROVED WATER SOFTENING PROPERTIES, LOWER RELEASE OF HEAVY METALS, AND RELATIVE METHOD OF MANUFACTURING MOMA S.R.L. (IT) 2011-03-03 US claimed
EP-2276872-A1 DEVICE FOR THERMOHYDRAULIC APPLICATIONS WITH IMPROVED WATER SOFTENING PROPERTIES, LOWER RELEASE OF HEAVY METALS, AND RELATIVE METHOD OF MANUFACTURING Moma S.r.l. (IT) 2011-01-26 EP claimed
WO-2009130288-A1 DEVICE FOR THERMOHYDRAULIC APPLICATIONS WITH IMPROVED WATER SOFTENING PROPERTIES, LOWER RELEASE OF HEAVY METALS, AND RELATIVE METHOD OF MANUFACTURING MOMA S.R.L. (IT) 2009-10-29 WO claimed
US-7459388-B2 Methods of forming dual-damascene interconnect structures using adhesion layers having high internal compressive stresses SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-12-02 US claimed
US-7393795-B2 Methods for post-etch deposition of a dielectric film APPLIED MATERIALS, INC. (US) 2008-07-01 US claimed
US-20080057697-A1 Methods of Forming Dual-Damascene Interconnect Structures Using Adhesion Layers Having High Internal Compressive Stress and Structures Formed Thereby SAMSUNG ELECTRONICS CO., LTD. 2008-03-06 US claimed
US-20070175858-A1 Methods for post-etch deposition of a dielectric film APPLIED MATERIALS, INC. 2007-08-02 US claimed
EP-0626683-B1 Microwave processing apparatus and process for producing an inorganic dielectrique film CANON KK (JP) 1999-08-11 EP claimed
US-5494712-A Method of forming a plasma polymerized film THE DOW CHEMICAL COMPANY (US) 1996-02-27 US claimed