SCHEMBL76133

SCHEMBL76133

O=C(NCO)c1cc2ccccc2oc1=O

nearest known ligand 0.83

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
MAOB P27338 7/20 0.75
NPC1 O15118 4/20 0.71
L3MBTL1 Q9Y468 2/20 0.71
KDM4E B2RXH2 4/20 0.69
ALDH1A1 P00352 4/20 0.69
HSD17B10 Q99714 3/20 0.69
MEN1 O00255 1/20 0.67
MAPK1 P28482 1/20 0.67
HTT P42858 1/20 0.67
KMT2A Q03164 1/20 0.67
SMN1; SMN2 Q16637 1/20 0.67
TDP1 Q9NUW8 1/20 0.67
MAOA P21397 3/20 0.67
F12 P00748 1/20 0.67
RAB9A P51151 3/20 0.66
HPGD P15428 1/20 0.66

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3040430 0.90 MAOB (0.73) MAOBNPC1L3MBTL1KDM4EALDH1A1
SCHEMBL15058644 0.88 MAOB (0.73) MAOBNPC1L3MBTL1KDM4EALDH1A1
SCHEMBL13448131 0.86 MAOB (0.67) MAOBNPC1L3MBTL1KDM4EALDH1A1
SCHEMBL3045340 0.86 MAOB (0.67) MAOBNPC1L3MBTL1KDM4EALDH1A1
SCHEMBL4390923 0.86 MAOB (1.00) MAOBNPC1L3MBTL1KDM4EALDH1A1
SCHEMBL30214896 0.86 MAOB (1.00) MAOBNPC1L3MBTL1KDM4EALDH1A1
SCHEMBL15892984 0.85 MAOB (1.00) MAOBNPC1L3MBTL1KDM4EALDH1A1
SCHEMBL14346006 0.85 MAOB (0.76) MAOBNPC1L3MBTL1KDM4EALDH1A1
SCHEMBL10047718 0.84 MAOB (0.68) MAOBNPC1L3MBTL1KDM4EALDH1A1
SCHEMBL34468932 0.83 NPC1 (1.00) MAOBNPC1L3MBTL1KDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8586975-B2 Photoelectric conversion element, method for manufacturing photoelectric conversion element, and electronic apparatus SEIKO EPSON CORPORATION (JP) 2013-11-19 US disclosed
US-20120119314-A1 PHOTOELECTRIC CONVERSION ELEMENT, METHOD FOR MANUFACTURING PHOTOELECTRIC CONVERSION ELEMENT, AND ELECTRONIC APPARATUS SEIKO EPSON CORPORATION (JP) 2012-05-17 US disclosed
US-20120119314-A1 PHOTOELECTRIC CONVERSION ELEMENT, METHOD FOR MANUFACTURING PHOTOELECTRIC CONVERSION ELEMENT, AND ELECTRONIC APPARATUS SEIKO EPSON CORPORATION (JP) 2012-05-17 US disclosed
US-8129713-B2 Photoelectric conversion element, method for manufacturing photoelectric conversion element, and electronic apparatus SEIKO EPSON CORPORATION (JP) 2012-03-06 US disclosed
US-8129713-B2 Photoelectric conversion element, method for manufacturing photoelectric conversion element, and electronic apparatus SEIKO EPSON CORPORATION (JP) 2012-03-06 US disclosed
US-8026029-B2 Method of manufacturing charged particle, charged particle, electrophoretic dispersion liquid, electrophoretic sheet, electrophoretic device and electronic equipment SEIKO EPSON CORPORATION (JP) 2011-09-27 US disclosed
US-8026029-B2 Method of manufacturing charged particle, charged particle, electrophoretic dispersion liquid, electrophoretic sheet, electrophoretic device and electronic equipment SEIKO EPSON CORPORATION (JP) 2011-09-27 US disclosed
US-20070195402-A1 METHOD OF MANUFACTURING CHARGED PARTICLE, CHARGED PARTICLE, ELECTROPHORETIC DISPERSION LIQUID, ELECTROPHORETIC SHEET, ELECTROPHORETIC DEVICE AND ELECTRONIC EQUIPMENT SEIKO EPSON CORPORATION (JP) 2007-08-23 US disclosed
US-20070187792-A1 PHOTOELECTRIC CONVERSION ELEMENT, METHOD FOR MANUFACTURING PHOTOELECTRIC CONVERSION ELEMENT, AND ELECTRONIC APPARATUS SEIKO EPSON CORPORATION (JP) 2007-08-16 US disclosed