SCHEMBL7619638

SCHEMBL7619638

OC1CC2C3CCC(C3)C2C1O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24278612 1.00
SCHEMBL25797964 1.00
Acetic Acid SCHEMBL4926998 0.87 KMT2A (0.35)
SCHEMBL13991204 0.78
SCHEMBL14123456 0.78 SLC1A2 (0.39)
SCHEMBL14118139 0.77 TDP1 (0.38)
SCHEMBL9640840 0.75
SCHEMBL14123433 0.75
SCHEMBL4926266 0.74
SCHEMBL14384202 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4705279-A1 RADICALLY POLYMERISABLE COMPOUND AND COMPOSITION Mühlbauer Technology GmbH (DE) 2026-03-11 EP disclosed
CN-119144746-A IncrRNA reference gene under osmanthus fragrans hormone treatment, primer and application thereof 湖北科技学院 2024-12-17 CN disclosed
WO-2024227533-A1 RADICALLY POLYMERISABLE COMPOUND AND COMPOSITION MÜHLBAUER TECHNOLOGY GMBH (DE) 2024-11-07 WO disclosed
US-20240094519-A1 ACETALS OF TRICYCLODECANE ALCOHOLS AS IMMERSION LIQUID MEDIA CARL ZEISS JENA GMBH (DE) 2024-03-21 US disclosed
EP-4206238-A1 SOLID TITANIUM CATALYST COMPONENT, OLEFIN POLYMERIZATION CATALYST, OLEFIN POLYMERIZATION METHOD, AND PROPYLENE POLYMER Mitsui Chemicals, Inc. (JP) 2023-07-05 EP disclosed
CN-106928061-B Continuous process for the carbonylation of ethylene 璐彩特国际英国有限公司 2020-08-28 CN disclosed
US-20170153549-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING ORGANIC GROUP HAVING ALIPHATIC POLYCYCLIC STRUCTURE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-06-01 US disclosed
US-20170153549-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING ORGANIC GROUP HAVING ALIPHATIC POLYCYCLIC STRUCTURE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-06-01 US disclosed
US-20120148517-A1 Hair Relaxing and Straightening Compositions INTERNATIONAL FLORA TECHNOLOGIES, LTD. (US) 2012-06-14 US disclosed
US-20080206668-A1 NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
US-20070060663-A1 Photocurable composition, photocurable ink composition, printing method and resist composition using the same KONICA MINOLTA MEDICAL & GRAPHIC, INC. 2007-03-15 US disclosed
US-20070060663-A1 Photocurable composition, photocurable ink composition, printing method and resist composition using the same KONICA MINOLTA MEDICAL & GRAPHIC, INC. 2007-03-15 US disclosed
JP-2002003429-A ALICYCLIC VINYL ETHER COMPOUND AND METHOD FOR PRODUCING THE SAME NISSAN CHEM IND LTD 2002-01-09 JP disclosed
JP-2001122827-A ACRYLATE COMPOUND AND METHOD FOR PRODUCING THE SAME NISSAN CHEM IND LTD 2001-05-08 JP disclosed