⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1634736 | 0.88 | — | — | |
| SCHEMBL433602 | 0.88 | — | — | |
| SCHEMBL587732 | 0.85 | — | — | |
| SCHEMBL20594195 | 0.83 | — | — | |
| SCHEMBL434789 | 0.80 | — | — | |
| SCHEMBL11873304 | 0.80 | — | — | |
| SCHEMBL8521435 | 0.78 | — | — | |
| SCHEMBL28725279 | 0.77 | EPHX1 (0.31) | — | |
| SCHEMBL29489294 | 0.75 | — | — | |
| SCHEMBL20597100 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6391433-B1 | — | — | None | — | — | US | disclosed |
| US-6391433-B2 | COMPRISING A DITHIAN RING CONTAINING SULFUR COMPOUND; IMPACT RESISTANCE, GOOD ADHESIVENESS BETWEEN THE SUBSTRATE AND A THIN FILM COATING, SCRATCH RESISTANCE AND GOOD ANTIREFLECTION CAPABILITIES | HOYA CORPORATION (JP) | 2002-05-21 | — | — | US | disclosed |
| US-6248431-B1 | THIN FILM LAYER FORMED BY CURING COATING COMPOSITION COMPRISING DITHIAN RING CONTAINING SULFUR COMPOUND OR BENZENE RING CONTAINING SULFUR COMPOUND AND POLYFUNCTIONAL THIOL | HOYA CORPORATION (JP) | 2001-06-19 | — | — | US | disclosed |
| US-20010003621-A1 | Coating composition and thin film layer for optical parts | JIANG JIAN (JP) | 2001-06-14 | — | — | US | disclosed |
| EP-0964019-A1 | Coating composition for optical parts, thin film layer made of it and optical part comprising it | HOYA CORPORATION (JP) | 1999-12-15 | — | — | EP | disclosed |
| EP-0553801-B1 | Use of sulfur-containing acid phosphoric ester as internal release agent | MITSUI TOATSU CHEMICALS (JP) | 1997-04-23 | — | — | EP | disclosed |
| US-5389708-A | Polymerizing polyisocyanate or polyisothiocyanate with polyol or polythiol in presence of thiophosphoric or dithiophosphoric acid ester | MITSUI TOATSU CHEMICALS, INC. (JP) | 1995-02-14 | — | — | US | disclosed |
| EP-0553801-A1 | Use of sulfur-containing acid phosphoric ester as internal release agent | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1993-08-04 | — | — | EP | disclosed |