SCHEMBL7642902

SCHEMBL7642902

CC1CSC23SCC(C)SSC2SC(CS3)SS1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL635159 0.61
SCHEMBL4075365 0.55
SCHEMBL1381459 0.55
SCHEMBL1402564 0.54
SCHEMBL6828960 0.53
SCHEMBL4069783 0.52
SCHEMBL9187319 0.51
SCHEMBL1382365 0.51
SCHEMBL1382363 0.51
SCHEMBL3318915 0.50

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6365223-B1 HYDROPHOBIC RESINS CONTAINING SULFUR, SUCH AS POLYTHIOETHERS, DIPPING INTO A LIQUID COMPRISING AN INORGANIC AND/OR AN ORGANIC ACID; THE ORGANIC ACID IS A MIXTURE OF A SULFONIC ACID COMPOUND AND A PHENOL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2002-04-02 US disclosed
EP-1024223-A2 Process for tinting a resin for optical materials MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-08-02 EP disclosed