SCHEMBL7647263

SCHEMBL7647263

C=C(CC)C(=O)OCCCCCC.C=C(CC=C(C)C(=O)O)C(=O)OCCO.C=C(CC=Cc1ccccc1)C(=O)OC

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.38
TDP1 Q9NUW8 1/20 0.35
TSHR P16473 4/20 0.34
EGFR P00533 1/20 0.34
POLB P06746 1/20 0.34
ALDH1A1 P00352 2/20 0.33
LMNA P02545 2/20 0.33
SMN1; SMN2 Q16637 2/20 0.32
NPC1 O15118 1/20 0.32
RAB9A P51151 1/20 0.32
MAPT P10636 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
TP53 P04637 1/20 0.31
CYP3A4 P08684 1/20 0.31
MAPK1 P28482 1/20 0.31
PAM P19021 1/20 0.31
BCHE P06276 2/20 0.31
FAAH O00519 2/20 0.31
ACHE P22303 1/20 0.31
MEN1 O00255 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7964778 0.92 KDM4E (0.37) KDM4ETDP1TSHREGFRPOLB
SCHEMBL10939354 0.90 KDM4E (0.46) KDM4ETDP1TSHREGFRPOLB
SCHEMBL3331594 0.89 KDM4E (0.43) KDM4ETDP1TSHREGFRPOLB
SCHEMBL3810349 0.89 KDM4E (0.39) KDM4ETDP1TSHREGFRALDH1A1
Acrylic Acid SCHEMBL6383526 0.88 TSHR (0.41) KDM4ETDP1TSHREGFRPOLB
SCHEMBL11413027 0.85 KDM4E (0.40) KDM4ETDP1TSHRPOLBALDH1A1
SCHEMBL7717061 0.84 KDM4E (0.46) KDM4ETDP1TSHREGFRPOLB
SCHEMBL10940136 0.84 KDM4E (0.42) KDM4ETDP1TSHREGFRPOLB
SCHEMBL6765656 0.83 KDM4E (0.43) KDM4ETDP1TSHREGFRPOLB
SCHEMBL970624 0.83 TSHR (0.41) KDM4ETDP1TSHREGFRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6468720-B1 TRANSPORT SPEED OF 22 TO 40 MM/SEC. AT LEAST 117 DEGREES C IN NOT LESS THAN 10 SEC, CONTACTING HEATER AT 90 TO 115 C; HIGH CONTRAST WITHOUT FOGGING, REDUCED VARIATION OF PERFORMANCE, DIMENSIONAL CHANGE, DENSITY FLUCTUATION KONICA CORPORATION (JP) 2002-10-22 US disclosed
US-6329127-B1 HALOGEN-RELEASING PRECURSOR HAVING AT LEAST ONE DISSOCIATIVE OR HYDROPHILIC SUBSTITUENT AND A SECOND HYDROPHOBIC HALOGEN-RELEASING PRECURSOR; FUJI PHOTO FILM CO., LTD. (JP) 2001-12-11 US disclosed
EP-1094361-A1 Processing method of photothermographic material KONICA CORPORATION (JP) 2001-04-25 EP disclosed
US-6156491-A Heat developable light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 2000-12-05 US disclosed
US-6083680-A HIGH IN SENSITIVITY AND HIGH IN CONTRAST, AND CAN PROVIDE AN IMAGE LOW IN DMIN BY UV LIGHT, LIGHT-INSENSITIVE ORGANIC SILVER SALT, A LIGHT-SENSITIVE SILVER HALIDE, FUJI PHOTO FILM CO., LTD. (JP) 2000-07-04 US disclosed