SCHEMBL7654225

SCHEMBL7654225

CCCCC[Ru](C1=CC=CC1)C1=CC=CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7506111 0.94
SCHEMBL5851125 0.76
Hexane SCHEMBL29216668 0.68 TSHR (0.30)
SCHEMBL1373411 0.67
Tetradecane SCHEMBL28024811 0.67 TSHR (0.35)
SCHEMBL7214676 0.66
SCHEMBL284854 0.66
Hexane SCHEMBL28311153 0.66 TSHR (0.32)
Octane SCHEMBL28018307 0.66 TSHR (0.38)
SCHEMBL7577764 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-2002114796-A RUTHENIUM COMPOUND FOR CHEMICAL VAPOR DEPOSITION AND METHOD FOR CHEMICAL VAPOR DEPOSITION OF RUTHENIUM THIN FILM OR RUTHENIUM COMPOUND THIN FILM TANAKA KIKINZOKU KOGYO KK 2002-04-16 JP disclosed