⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16146464 | 0.74 | — | — | |
| SCHEMBL18981047 | 0.73 | EGFR (0.39) | — | |
| SCHEMBL12121151 | 0.73 | IDO1 (0.35) | — | |
| SCHEMBL28869935 | 0.73 | EGFR (0.46) | — | |
| SCHEMBL12121152 | 0.70 | PTPN11 (0.32) | — | |
| SCHEMBL13974970 | 0.70 | EGFR (0.39) | — | |
| SCHEMBL24711428 | 0.70 | EGFR (0.36) | — | |
| SCHEMBL18981050 | 0.70 | EGFR (0.37) | — | |
| SCHEMBL18981019 | 0.70 | EGFR (0.40) | — | |
| SCHEMBL1331203 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 771 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9527938-B2 | Copolymer for lithography and method of manufacturing the same, resist composition, and method of manufacturing substrate | MITSUBISHI RAYON CO., LTD. (JP) | 2016-12-27 | — | — | US | claimed |
| US-20150099230-A1 | COPOLYMER FOR LITHOGRAPHY AND METHOD OF MANUFACTURING THE SAME, RESIST COMPOSITION, AND METHOD OF MANUFACTURING SUBSTRATE | MITSUBISHI RAYON CO., LTD. (JP) | 2015-04-09 | — | — | US | claimed |
| US-20050191579-A1 | Protecting groups in polymers, photoresists and processes for microlithography | FEIRING ANDREW E (US) | 2005-09-01 | — | — | US | claimed |
| US-6899995-B2 | Protecting groups in polymers, photoresists and processes for microlithography | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2005-05-31 | — | — | US | claimed |
| US-20040023157-A1 | Protecting groups in polymers, photoresists and processes for microlithography | E.I. DU PONT DE NEMOURS AND COMPANY | 2004-02-05 | — | — | US | claimed |
| EP-1340125-A2 | PROTECTING GROUPS IN POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2003-09-03 | — | — | EP | claimed |
| WO-2002044845-A2 | PROTECTING GROUPS IN POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2002-06-06 | — | — | WO | claimed |
| EP-4685562-A1 | COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-28 | — | — | EP | disclosed |
| US-12535737-B2 | Material for forming adhesive film, patterning process, and method for forming adhesive film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-27 | — | — | US | disclosed |
| US-20260026318-A1 | COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-01-22 | — | — | US | disclosed |
| EP-4202548-B1 | MATERIAL FOR FORMING ADHESIVE FILM, PATTERNING PROCESS, AND METHOD FOR FORMING ADHESIVE FILM | SHINETSU CHEMICAL CO (JP) | 2025-11-19 | — | — | EP | disclosed |
| US-20250341779-A1 | COMPOSITION FOR FORMING ADHESIVE FILM, PATTERNING PROCESS, AND METHOD FOR FORMING ADHESIVE FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-06 | — | — | US | disclosed |
| EP-4644992-A2 | COMPOSITION FOR FORMING ADHESIVE FILM, PATTERNING PROCESS, AND METHOD FOR FORMING ADHESIVE FILM | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-11-05 | — | — | EP | disclosed |
| US-6531616-B2 | Contacting lactone compound with an oxalate in presence of a base and a solvent to form an intermediate mixture; reacting with a formaldehyde derivative to form a product mixture; isolating alpha - substituted hydrocarbylidene lactones | E. I. DU PONT DE NEMOURS AND COMPANY | 2003-03-11 | — | — | US | disclosed |
| US-20020143195-A1 | Process for the preparation of a-methylenelactones and a-substituted hydrocarbylidene lactones | E. I. DU PONT DE NEMOURS AND COMPANY | 2002-10-03 | — | — | US | disclosed |
| WO-2002044845-A2 | PROTECTING GROUPS IN POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2002-06-06 | — | — | WO | disclosed |
| EP-1074566-A1 | COPOLYMER, PROCESS FOR PRODUCING THE SAME, AND RESIST COMPOSITION | Mitsubishi Rayon Co., Ltd. (JP) | 2001-02-07 | — | — | EP | disclosed |
| EP-0722960-B1 | Copolymers for preparing cast glass, or molding materials for preparing heat stable shaped articles | AGOMER GES MIT BESCHRAENKTER H (DE) | 1999-06-02 | — | — | EP | disclosed |
| US-5880235-A | POLYMER PREPARED BY COPOLYMERIZING ALPHA-METHYLENE-GAMMA-BUTYROLACTONE AND VINYLICALLY UNSATURATED MONOMER | AGOMER GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) | 1999-03-09 | — | — | US | disclosed |
| EP-0722960-A2 | Copolymers for preparing cast glass, or molding materials for preparing heat stable shaped articles | Degussa Aktiengesellschaft (DE) | 1996-07-24 | — | — | EP | disclosed |