⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27146183 | 0.88 | — | — | |
| SCHEMBL11791635 | 0.88 | — | — | |
| SCHEMBL1833565 | 0.85 | CETP (0.31) | — | |
| SCHEMBL27139272 | 0.71 | — | — | |
| SCHEMBL6291349 | 0.71 | CETP (0.33) | — | |
| SCHEMBL1840096 | 0.69 | CETP (0.35) | — | |
| SCHEMBL11829210 | 0.69 | CETP (0.35) | — | |
| SCHEMBL1837324 | 0.68 | CETP (0.36) | — | |
| SCHEMBL27794287 | 0.68 | SIRT2 (0.39) | — | |
| SCHEMBL27794324 | 0.68 | SIRT2 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 195 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240231230-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| US-20240201593-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| CN-118159910-A | Additive-containing silicon-containing resist underlayer film forming composition | 日产化学株式会社 | 2024-06-07 | — | — | CN | disclosed |
| CN-113518762-B | Release layer dispersion of layered compound and transparent substrate using the same | 公立大学法人大阪 | 2024-05-28 | — | — | CN | disclosed |
| US-20240162086-A1 | SUBSTRATE WITH THIN FILM, AND SEMICONDUCTOR SUBSTRATE | NISSAN CHEMICAL CORPORATION (JP) | 2024-05-16 | — | — | US | disclosed |
| CN-117940850-A | Composition for forming silicon-containing resist underlayer film, laminate using same, and method for producing semiconductor element | 日产化学株式会社 | 2024-04-26 | — | — | CN | disclosed |
| US-11966164-B2 | Semiconductor device production method employing silicon-containing resist underlayer film-forming composition including organic group having ammonium group | NISSAN CHEMICAL CORPORATION (JP) | 2024-04-23 | — | — | US | disclosed |
| US-11961636-B2 | Silica-containing insulating composition | NISSAN CHEMICAL CORPORATION (JP) | 2024-04-16 | — | — | US | disclosed |
| CN-111302926-B | Beta-diketone cerium (IV) compound and preparation and application thereof | 湖北固润科技股份有限公司 | 2024-04-02 | — | — | CN | disclosed |
| WO-2024063044-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2024-03-28 | — | — | WO | disclosed |
| US-20100330505-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING CYCLIC AMINO GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-12-30 | — | — | US | disclosed |
| US-20100304305-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING POLYMER HAVING NITROGEN-CONTAINING SILYL GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20100291487-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING UREA GROUP | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 2010-11-18 | — | — | US | disclosed |
| EP-2249204-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING CYCLIC AMINO GROUP | Nissan Chemical Industries, Ltd. (JP) | 2010-11-10 | — | — | EP | disclosed |
| EP-2196854-A1 | COMPOSITION CONTAINING POLYMER HAVING NITROGENOUS SILYL GROUP FOR FORMING RESIST UNDERLAYER FILM | Nissan Chemical Industries, Ltd. (JP) | 2010-06-16 | — | — | EP | disclosed |
| EP-0997534-B1 | Process for the resolution of racemic arylalkylcarboxylic acid esters | BASF AG (DE) | 2007-04-18 | — | — | EP | disclosed |
| US-6365398-B1 | REACTING RACEMIC CARBOXYLIC ACID ESTER WITH RACEMIC ALCOHOL IN PRESENCE OF A CARBOXYL ESTER HYDROLASE | BASF AKTIENGESELLSCHAFT (DE) | 2002-04-02 | — | — | US | disclosed |
| US-6201147-B1 | REACTING COMPOUNDS WITH AN ALCOHOL IN THE PRESENCE OF A LIPASE OR ESTERASE | BASF AKTIENGESELLSCHAFT (DE) | 2001-03-13 | — | — | US | disclosed |
| EP-1031629-A2 | Method of preparation of stereoisomeric carboxylic acid esters | BASF AKTIENGESELLSCHAFT (DE) | 2000-08-30 | — | — | EP | disclosed |
| EP-0997534-A2 | Process for the resolution of racemic arylalkylcarboxylic acid esters | BASF AKTIENGESELLSCHAFT (DE) | 2000-05-03 | — | — | EP | disclosed |