⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL604086 | 0.81 | — | — | |
| SCHEMBL352849 | 0.79 | — | — | |
| SCHEMBL5408140 | 0.79 | — | — | |
| SCHEMBL5407202 | 0.79 | — | — | |
| SCHEMBL767053 | 0.74 | — | — | |
| SCHEMBL23874523 | 0.73 | — | — | |
| SCHEMBL19720168 | 0.73 | — | — | |
| SCHEMBL446773 | 0.73 | — | — | |
| SCHEMBL597545 | 0.73 | — | — | |
| SCHEMBL598516 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 331 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240231230-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| US-20240201593-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| CN-118159910-A | Additive-containing silicon-containing resist underlayer film forming composition | 日产化学株式会社 | 2024-06-07 | — | — | CN | disclosed |
| CN-113518762-B | Release layer dispersion of layered compound and transparent substrate using the same | 公立大学法人大阪 | 2024-05-28 | — | — | CN | disclosed |
| US-20240162086-A1 | SUBSTRATE WITH THIN FILM, AND SEMICONDUCTOR SUBSTRATE | NISSAN CHEMICAL CORPORATION (JP) | 2024-05-16 | — | — | US | disclosed |
| CN-114341232-B | Process for producing silicon-containing polymer composition | 日产化学株式会社 | 2024-05-07 | — | — | CN | disclosed |
| CN-117940850-A | Composition for forming silicon-containing resist underlayer film, laminate using same, and method for producing semiconductor element | 日产化学株式会社 | 2024-04-26 | — | — | CN | disclosed |
| US-11966164-B2 | Semiconductor device production method employing silicon-containing resist underlayer film-forming composition including organic group having ammonium group | NISSAN CHEMICAL CORPORATION (JP) | 2024-04-23 | — | — | US | disclosed |
| US-11961636-B2 | Silica-containing insulating composition | NISSAN CHEMICAL CORPORATION (JP) | 2024-04-16 | — | — | US | disclosed |
| WO-2024063044-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2024-03-28 | — | — | WO | disclosed |
| EP-0200915-B1 | AMINOPROPANOL DERIVATIVES, PROCESS FOR THEIR PREPARATION, THEIR USE AND MEDICINES CONTAINING THEM | Roche Diagnostics GmbH (DE) | 1989-09-27 | — | — | EP | disclosed |
| US-4863949-A | CARDIOVASCULAR DISORDER TREATMENT | BOEHRINGER MANNHEIM GMBH (DE) | 1989-09-05 | — | — | US | disclosed |
| EP-0280951-A1 | Amino-propanol derivatives, process for their preparation and medicines containing these compounds, as well as intermediates | Roche Diagnostics GmbH (DE) | 1988-09-07 | — | — | EP | disclosed |
| EP-0200915-A1 | Aminopropanol derivatives, process for their preparation, their use and medicines containing them | Roche Diagnostics GmbH (DE) | 1986-11-12 | — | — | EP | disclosed |
| EP-0004532-B1 | 1-ARYLOXY-3-NITRATOALKYLAMINO-2-PROPANOLS, PROCESS FOR THEIR PREPARATION AND PHARMACEUTICAL COMPOSITIONS | MERCK PATENT GmbH (DE) | 1981-10-14 | — | — | EP | disclosed |
| US-4288452-A | 1-Aryloxy-3-nitratoalkylamino-2-propanols and use as β-receptor blocker | MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) | 1981-09-08 | — | — | US | disclosed |
| US-4225608-A | ANTIDEPRESSANTS | MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) | 1980-09-30 | — | — | US | disclosed |
| EP-0004532-A1 | 1-Aryloxy-3-nitratoalkylamino-2-propanols, process for their preparation and pharmaceutical compositions | MERCK PATENT GmbH (DE) | 1979-10-17 | — | — | EP | disclosed |
| EP-0004288-A2 | Phenoxyalkyl amines, pharmaceutical compositions containing them, and process for their preparation | MERCK PATENT GmbH (DE) | 1979-10-03 | — | — | EP | disclosed |
| US-4016281-A | Tetralone and indanone compounds | MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DT) | 1977-04-05 | — | — | US | disclosed |