SCHEMBL767090

SCHEMBL767090

CC1=CCC[CH]1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10583264 0.80
SCHEMBL466439 0.80
SCHEMBL8036365 0.67
SCHEMBL790988 0.67
SCHEMBL1706184 0.65
SCHEMBL12799287 0.61
SCHEMBL3406429 0.60
SCHEMBL1269421 0.59 PTPN1 (0.48)
SCHEMBL1269417 0.59 PTPN1 (0.48)
SCHEMBL10582509 0.58

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 565 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240231230-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-07-11 US disclosed
EP-4398285-A1 ADHESIVE COMPOSITION, MULTILAYER BODY, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE Nissan Chemical Corporation (JP) 2024-07-10 EP disclosed
CN-118295212-A Composition for forming resist underlayer film containing glycol structure 日产化学株式会社 2024-07-05 CN disclosed
US-20240218293-A1 CLEANING AGENT COMPOSITION AND CLEANING METHOD NISSAN CHEMICAL CORPORATION (JP) 2024-07-04 US disclosed
US-12025916-B2 Resist underlayer film-forming composition that contains triaryldiamine-containing novolac resin to which aromatic vinyl compound is added NISSAN CHEMICAL CORPORATION (JP) 2024-07-02 US disclosed
EP-3512852-B1 TRAF 6 INHIBITORS HELMHOLTZ ZENTRUM MUENCHEN DEUTSCHES FORSCHUNGSZENTRUM GESUNDHEIT & UMWELT GMBH (DE) 2024-06-26 EP disclosed
US-20240201592-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-06-20 US disclosed
US-20240201593-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-06-20 US disclosed
WO-2024128199-A1 RELEASER COMPOSITION FOR PHOTOIRRADIATION RELEASE, AND ADHESIVE COMPOSITION FOR PHOTOIRRADIATION RELEASE 日産化学株式会社 2024-06-20 WO disclosed
WO-2024122488-A1 COMPOSITION FOR FORMING PROTECTIVE FILM 日産化学株式会社 2024-06-13 WO disclosed
US-4622417-A DIETETICS GENERAL FOODS CORPORATION (US) 1986-11-11 US disclosed
US-4622232-A L-aminodicarboxylic acid alkanes GENERAL FOODS CORPORATION (US) 1986-11-11 US disclosed
EP-0199258-A2 L-Aminodicarboxylic acid amides and an edible composition containing same GENERAL FOODS CORPORATION (US) 1986-10-29 EP disclosed
EP-0199257-A2 L-Aminodicarboxylic acid esters and an edible composition containing same as sweeteners GENERAL FOODS CORPORATION (US) 1986-10-29 EP disclosed
US-4619782-A L-aminodicarboxylic acid gem-diamines GENERAL FOODS CORPORATION (US) 1986-10-28 US disclosed
US-4619834-A Sweetening with L-aminodicarboxylic acid aminoalkenoic acid ester amides GENERAL FOODS CORPORATION (US) 1986-10-28 US disclosed
US-4603012-A L-aminodicarboxylic acid alkanes GENERAL FOODS CORPORATION (US) 1986-07-29 US disclosed
EP-0186173-A2 L-Aminodicarboxylic-(0-cycloalkyl)-L-aminocarboxylate alkyl esters, an edible composition containing same as sweeteners and a method for sweetening an edible composition GENERAL FOODS CORPORATION (US) 1986-07-02 EP disclosed
US-4572799-A L-Aminodicarboxylic acid amides GENERAL FOODS CORPORATION (US) 1986-02-25 US disclosed
US-4571308-A L-Aminodicarboxylic acid aminoalkenoic acid ester amides GENERAL FOODS CORPORATION (US) 1986-02-18 US disclosed