SCHEMBL769037

SCHEMBL769037

CC=C(C)C(=O)ON(C)C

nearest known ligand 0.34

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
KDM6B O15054 1/20 0.34
KDM5C P41229 1/20 0.34
EGLN1 Q9GZT9 1/20 0.34
PHF8 Q9UPP1 1/20 0.34
KDM2A Q9Y2K7 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2853929 1.00 KDM6B (0.34) KDM6BKDM5CEGLN1PHF8KDM2A
Chloromethane SCHEMBL10408053 0.95 KDM6B (0.32) KDM6BKDM5CEGLN1PHF8KDM2A
Chloromethane SCHEMBL10408050 0.95 KDM6B (0.32) KDM6BKDM5CEGLN1PHF8KDM2A
SCHEMBL375022 0.77 KDM6B (0.34) KDM6BKDM5CEGLN1PHF8KDM2A
SCHEMBL1037821 0.77 KDM6B (0.34) KDM6BKDM5CEGLN1PHF8KDM2A
SCHEMBL1401727 0.76 KDM6B (0.43) KDM6BKDM5CEGLN1PHF8KDM2A
Propane SCHEMBL28476845 0.75 KDM6B (0.33) KDM6BKDM5CEGLN1PHF8KDM2A
Hydroxyl Radical SCHEMBL28854230 0.75 KDM6B (0.33) KDM6BKDM5CEGLN1PHF8KDM2A
SCHEMBL27583328 0.75 TSHR (0.31)
Hydrochloric Acid SCHEMBL10688547 0.75 KDM6B (0.33) KDM6BKDM5CEGLN1PHF8KDM2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 138 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111285973-A Star-shaped cationic polymer flocculant and preparation method thereof 爱森(中国)絮凝剂有限公司 2020-06-16 CN claimed
CN-109762540-A Supermolecule plugging agent and preparation method thereof 中国石油集团川庆钻探工程有限公司 2019-05-17 CN claimed
CN-109705829-A Pressure-bearing leakage-stopping slurry and preparation method thereof 中国石油集团川庆钻探工程有限公司 2019-05-03 CN claimed
CN-101617272-B Photosensitive resin composition for black matrix, black matrix prepared from the same, and liquid crystal display including the black matrix LG ELECTRONICS INC 2012-06-20 CN claimed
CN-101617272-A Photosensitive resin composition for black matrix, black matrix prepared from the same, and liquid crystal display including the black matrix LG CHEMICAL LTD 2009-12-30 CN claimed
US-7579134-B2 cover layer comprises polyamic acid precursor curable to an adhesive polyimide base polymer and an ethylenically unsaturated photo-monomer; avoiding unwanted curling of a flexible printed circuit E. I. DUPONT DE NEMOURS AND COMPANY (US) 2009-08-25 US claimed
US-20060210819-A1 Polyimide composite coverlays and methods and compositions relating thereto U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2006-09-21 US claimed
US-5213740-A Processes for the preparation of toner compositions XEROX CORPORATION (US) 1993-05-25 US claimed
US-20230399445-A1 HIGH MOLECULAR WEIGHT POLYMERIC DISPERSIONS SOLENIS TECHNOLOGIES CAYMAN, L.P. (CH) 2023-12-14 US disclosed
US-20230399446-A1 HIGH MOLECULAR WEIGHT POLYMERIC DISPERSIONS WITH METAL SCAVENGER SOLENIS TECHNOLOGIES CAYMAN, L.P. (CH) 2023-12-14 US disclosed
US-20230399473-A1 HIGH MOLECULAR WEIGHT POLYMERIC DISPERSIONS MANUFACTURED UNDER CONTROLLED ADIABATIC CONDITIONS SOLENIS TECHNOLOGIES CAYMAN, L.P. (CH) 2023-12-14 US disclosed
EP-4289873-A1 HIGH MOLECULAR WEIGHT POLYMERIC DISPERSIONS MANUFACTURED UNDER CONTROLLED ADIABATIC CONDITIONS Solenis Technologies Cayman, L.P. (US) 2023-12-13 EP disclosed
EP-4289874-A1 HIGH MOLECULAR WEIGHT POLYMERIC DISPERSIONS WITH METAL SCAVENGER Solenis Technologies Cayman, L.P. (US) 2023-12-13 EP disclosed
EP-4289872-A1 HIGH MOLECULAR WEIGHT POLYMERIC DISPERSIONS Solenis Technologies Cayman, L.P. (US) 2023-12-13 EP disclosed
EP-1479502-A1 PROCESS FOR PRODUCING MOLDED ARTICLE OF RECLAIMED THERMOPLASTIC RESIN Suzuka Fuji Xerox Co., Ltd. (JP) 2004-11-24 EP disclosed
CN-1111761-C Magnetic coated carrier, two-component type developer and developing method CANON KK (JP) 2003-06-18 CN disclosed
CN-1390319-A Resin composition for toner and toner MITSUI CHEMICALS INC (JP) 2003-01-08 CN disclosed
CN-1285361-A Aqueous polymer capable of free-radial polymerizing monomer, process for producing said polymer and floccutant containing same KURITA WATER IND LTD (JP) 2001-02-28 CN disclosed
US-6127037-A INK SORPTIVE COATING COMPRISING OXAZOLINE POLYMER AND ARKWRIGHT, INCORPORATED (US) 2000-10-03 US disclosed
CN-1168490-A Magnetic coated carrier, two-component type developer and developing method CANON KK (JP) 1997-12-24 CN disclosed