⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3923447 | 0.92 | — | — | |
| SCHEMBL15977058 | 0.92 | — | — | |
| SCHEMBL12972119 | 0.86 | — | — | |
| SCHEMBL12898588 | 0.85 | — | — | |
| SCHEMBL16260985 | 0.85 | — | — | |
| SCHEMBL21630201 | 0.83 | TSHR (0.34) | — | |
| SCHEMBL12794802 | 0.82 | — | — | |
| SCHEMBL770570 | 0.82 | — | — | |
| SCHEMBL13301074 | 0.82 | TDP1 (0.39) | — | |
| SCHEMBL108269 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9217921-B2 | Resist underlayer film forming composition containing silicon having sulfide bond | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-12-22 | — | — | US | disclosed |
| US-20120070994-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING SULFIDE BOND | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-03-22 | — | — | US | disclosed |