Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Silver. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Silver SCHEMBL7643931 | 0.87 | — | — | |
| Silver SCHEMBL1753 | 0.82 | — | — | |
| Silver SCHEMBL8806143 | 0.82 | — | — | |
| Silver SCHEMBL1400995 | 0.82 | — | — | |
| Silver SCHEMBL9595852 | 0.82 | — | — | |
| Silver SCHEMBL18575266 | 0.67 | — | — | |
| Silver SCHEMBL1762284 | 0.67 | — | — | |
| Water SCHEMBL2849105 | 0.67 | — | — | |
| Silver SCHEMBL7634980 | 0.67 | — | — | |
| Silver SCHEMBL181593 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106492759-A | A kind of preparation method of the silver oxide/graphene oxide composite material that efficiently can catch radioactivity or highly toxic zwitterion altogether | 浙江农林大学 | 2017-03-15 | — | — | CN | claimed |
| CN-106492759-A | A kind of preparation method of the silver oxide/graphene oxide composite material that efficiently can catch radioactivity or highly toxic zwitterion altogether | 浙江农林大学 | 2017-03-15 | — | — | CN | disclosed |
| CN-105638729-A | Spherical silver/silver chloride composite material of hollow structure and preparation method thereof | 北京林业大学 | 2016-06-08 | — | — | CN | disclosed |
| CN-1148783-C | High-voltage discharging lamp | 皇家菲利浦电子有限公司 | 2004-05-05 | — | — | CN | disclosed |
| EP-0876679-B1 | HIGH PRESSURE DISCHARGE LAMP | KONINKL PHILIPS ELECTRONICS NV (NL) | 2002-02-27 | — | — | EP | disclosed |
| US-5986405-A | High pressure discharge lamp | U.S. PHILIPS CORPORATION (US) | 1999-11-16 | — | — | US | disclosed |
| CN-1209905-A | High-voltage discharging lamp | PHILIPS ELECTRONICS CO LTD (NL) | 1999-03-03 | — | — | CN | disclosed |
| EP-0876679-A1 | HIGH PRESSURE DISCHARGE LAMP | Koninklijke Philips Electronics N.V. (NL) | 1998-11-11 | — | — | EP | disclosed |
| WO-1998022974-A1 | HIGH PRESSURE DISCHARGE LAMP | PHILIPS ELECTRONICS N.V. (NL) | 1998-05-28 | — | — | WO | disclosed |
| US-4859277-A | Method for measuring plasma properties in semiconductor processing | TEXAS INSTRUMENTS INCORPORATED (US) | 1989-08-22 | — | — | US | disclosed |