⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1726461 | 0.73 | TSHR (0.33) | — | |
| SCHEMBL2354536 | 0.69 | — | — | |
| SCHEMBL10699973 | 0.65 | — | — | |
| SCHEMBL1542945 | 0.60 | — | — | |
| SCHEMBL1615192 | 0.60 | — | — | |
| SCHEMBL15301919 | 0.60 | — | — | |
| SCHEMBL6131702 | 0.60 | — | — | |
| SCHEMBL30824195 | 0.59 | TSHR (0.38) | — | |
| SCHEMBL235304 | 0.58 | TSHR (0.33) | — | |
| SCHEMBL14492812 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6358675-B1 | PHOTORESISTS, PATTERNS, MULTISTAGE REACTION, COATING ON SUPPORTS A SILICON POLYMER, EXPOSURE TO ACTINIC RADIATION AND DEVELOPMENT OF LATENT IMAGES AND POLYMERS | 3M INNOVATIVE PROPERTIES COMPANY | 2002-03-19 | — | — | US | claimed |
| EP-1118041-A2 | SILICON-CONTAINING ALCOHOLS AND POLYMERS HAVING SILICON-CONTAINING TERTIARY ESTER GROUPS MADE THEREFROM | 3M Innovative Properties Company (US) | 2001-07-25 | — | — | EP | claimed |
| WO-2000020925-A2 | SILICON-CONTAINING ALCOHOLS AND POLYMERS HAVING SILICON-CONTAINING TERTIARY ESTER GROUPS MADE THEREFROM | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2000-04-13 | — | — | WO | claimed |
| US-6358675-B1 | PHOTORESISTS, PATTERNS, MULTISTAGE REACTION, COATING ON SUPPORTS A SILICON POLYMER, EXPOSURE TO ACTINIC RADIATION AND DEVELOPMENT OF LATENT IMAGES AND POLYMERS | 3M INNOVATIVE PROPERTIES COMPANY | 2002-03-19 | — | — | US | disclosed |
| EP-1118041-A2 | SILICON-CONTAINING ALCOHOLS AND POLYMERS HAVING SILICON-CONTAINING TERTIARY ESTER GROUPS MADE THEREFROM | 3M Innovative Properties Company (US) | 2001-07-25 | — | — | EP | disclosed |
| WO-2000020925-A2 | SILICON-CONTAINING ALCOHOLS AND POLYMERS HAVING SILICON-CONTAINING TERTIARY ESTER GROUPS MADE THEREFROM | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2000-04-13 | — | — | WO | disclosed |