SCHEMBL7713865

SCHEMBL7713865

CC(F)[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29270318 0.78
Ethane SCHEMBL29270319 0.75
SCHEMBL19049 0.72
SCHEMBL2597609 0.72
SCHEMBL30504 0.72
SCHEMBL16144920 0.72
SCHEMBL703343 0.72
SCHEMBL25296 0.72
SCHEMBL21611870 0.71
Hydrochloric Acid SCHEMBL4467601 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118103958-A Etching method using silicon-containing hydrofluorocarbon 乔治洛德方法研究和开发液化空气有限公司 2024-05-28 CN disclosed
WO-2023069410-A1 ETCHING METHODS USING SILICON-CONTAINING HYDROFLUOROCARBONS L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2023-04-27 WO disclosed
CN-106701290-A Lubricating grease composition and preparation method thereof 上海禾泰特种润滑科技股份有限公司 2017-05-24 CN disclosed
US-20140230603-A1 POWDER MIXTURE HITACHI CHEMICAL COMPANY, LTD. (JP) 2014-08-21 US disclosed
US-6365528-B1 PROVIDING REACTOR HAVING A SEMICONDUCTOR SUBSTRATE MOUNTED ON A SUBSTRATE SUPPORT; FORMINGFLUORINE AND CARBON-CONTAINING SILICON OXIDE DIELECTRIC MATERIAL BY REACTING TOGETHER: OXIDIZER AND SILANE COMPOUND LSI LOGIC CORPORATION 2002-04-02 US disclosed