SCHEMBL7714432

SCHEMBL7714432

Cc1ccc(S(=O)(=O)OC2C3C=CC(O3)C2C(=O)OC(C)(C)C)cc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 2/20 0.35
CYP3A4 P08684 2/20 0.33
CYP2C19 P33261 2/20 0.33
MMP13 P45452 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP2C9 P11712 1/20 0.33
PKM P14618 1/20 0.33
CA1 P00915 3/20 0.33
CA2 P00918 3/20 0.33
CA12 O43570 2/20 0.33
CA9 Q16790 2/20 0.33
CA14 Q9ULX7 1/20 0.33
NR1D1 P20393 1/20 0.32
GPR119 Q8TDV5 1/20 0.32
STAT3 P40763 1/20 0.32
MEN1 O00255 2/20 0.31
KMT2A Q03164 2/20 0.31
ALDH1A1 P00352 1/20 0.31
MMP2 P08253 1/20 0.31
ANPEP P15144 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7715609 0.83 CYP3A4 (0.35) CYP2D6CYP3A4CYP2C19MMP13CYP1A2
SCHEMBL7715707 0.79
SCHEMBL8243701 0.71 CYP2D6 (0.47) CYP2D6CYP3A4CYP2C19MMP13CYP1A2
SCHEMBL3957338 0.71 CYP2D6 (0.47) CYP2D6CYP3A4CYP2C19MMP13CYP1A2
SCHEMBL21987475 0.70 CYP2D6 (0.52) CYP2D6CYP3A4CYP2C19MMP13CYP1A2
SCHEMBL16126799 0.70 CYP2D6 (0.52) CYP2D6CYP3A4CYP2C19MMP13CYP1A2
SCHEMBL21987454 0.68 CYP2D6 (0.47) CYP2D6CYP3A4CYP2C19MMP13CYP1A2
SCHEMBL7715585 0.67 PPM1B (0.37) CYP2D6CYP2C19MEN1KMT2AALDH1A1
SCHEMBL7716854 0.67 MAPK1 (0.35) MEN1KMT2AALDH1A1
SCHEMBL17362258 0.67 CYP2D6 (0.45) CYP2D6CYP3A4CYP2C19MMP13CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6372854-B1 POLYALKENAMERS USED AS PHOTORESISTS HAVING EXCELLENT OPTICAL ELECTRICAL PROPERTIES; HIGH RIGIDITY; HEAT RESISTANCE; ADHESION AND WEAR RESISTANCE; HYDROGENATION; ACIDOLYSIS MITSUI CHEMICALS, INC. (JP) 2002-04-16 US disclosed