SCHEMBL7717682

SCHEMBL7717682

O=C(O)c1c(F)c(OC(C(F)(F)F)C(F)(F)F)c2c(F)c(C(=O)O)c(F)c(OC(C(F)(F)F)C(F)(F)F)c2c1F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL7996160 0.98
SCHEMBL7996159 0.84
SCHEMBL6853314 0.69
SCHEMBL6853264 0.66
SCHEMBL7717693 0.65 SMN1; SMN2 (0.37)
SCHEMBL7717687 0.64 MEN1 (0.34)
SCHEMBL3653948 0.63 CYP1A2 (0.36)
SCHEMBL31181867 0.63 TSHR (0.36)
SCHEMBL31181846 0.63 MEN1 (0.34)
Hydrochloric Acid SCHEMBL7995707 0.63 TSHR (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6380271-B1 MIXING A POLYBENZOXAZOLE PRECURSOR OR A POLYBENZOXAZOLE RESIN WITH AN OLIGOMER, FORMING FILM FROM RESULTING MIXTURE, HEATING FILM IN NITROGEN CONTAINING OXYGEN TO GIVE RISE TO THERMAL DECOMPOSITION AND GASIFICATION OF OLIGOMER TO FORM RESIN LAYER SUMITOMO BAKELITE COMPANY LIMITED (JP) 2002-04-30 US disclosed
US-6297351-B1 EXCELLENT IN ELECTRIC CHARACTERISTICS AND HEAT RESISTANCE, PRECURSOR FROM A DICARBOXYLIC ACID AND A BISAMINOPHENOL COMPOUND OR A DIAMINODIHYDROXY SUMITOMO BAKELITE COMPANY LIMITED (JP) 2001-10-02 US disclosed