Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.54 |
| ▸ | THRB | P10828 | 1/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | APEX1 | P27695 | 1/20 | 0.42 |
| ▸ | HTT | P42858 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | FAAH | O00519 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3363130 | 0.95 | TSHR (0.51) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL1898441 | 0.85 | TSHR (0.56) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL3503120 | 0.83 | TSHR (0.59) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL31636159 | 0.83 | TSHR (0.59) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL870590 | 0.83 | TSHR (0.59) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL31636173 | 0.83 | TSHR (0.59) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL31636152 | 0.83 | TSHR (0.59) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL382201 | 0.82 | TSHR (0.61) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL19991477 | 0.81 | TSHR (0.65) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL20503431 | 0.81 | TSHR (0.65) | TSHRTHRBPOLBAPEX1HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110871269-B | Alloy powder composition | 大同特殊钢株式会社 | 2022-11-08 | — | — | CN | disclosed |
| CN-110871269-A | Alloy powder composition | 大同特殊钢株式会社 | 2020-03-10 | — | — | CN | disclosed |
| US-20020024011-A1 | Method for correcting opaque defects in reticles for charged-particle-beam microlithography, and reticles produced using same | NIKON CORPORATION | 2002-02-28 | — | — | US | disclosed |