Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Triethylene Glycol SCHEMBL9302655 | 0.70 | MEN1 (0.50) | MEN1KMT2ATSHRMAPK1 | |
| Tetraethylene Glycol SCHEMBL9301839 | 0.70 | MEN1 (0.50) | MEN1KMT2ATSHRMAPK1 | |
| SCHEMBL125343 | 0.69 | MEN1 (0.55) | MEN1KMT2ATSHRMAPK1 | |
| SCHEMBL236333 | 0.69 | MEN1 (0.55) | MEN1KMT2ATSHRMAPK1 | |
| SCHEMBL899138 | 0.69 | MEN1 (0.55) | MEN1KMT2ATSHRMAPK1 | |
| SCHEMBL1627450 | 0.69 | MEN1 (0.55) | MEN1KMT2ATSHRMAPK1 | |
| SCHEMBL8860368 | 0.69 | MEN1 (0.55) | MEN1KMT2ATSHRMAPK1 | |
| SCHEMBL113727 | 0.69 | MEN1 (0.55) | MEN1KMT2ATSHRMAPK1 | |
| SCHEMBL875411 | 0.69 | MEN1 (0.55) | MEN1KMT2ATSHRMAPK1 | |
| SCHEMBL10998172 | 0.69 | MEN1 (0.55) | MEN1KMT2ATSHRMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6495096-B1 | DEODORANT FOR SUBSTANCES CONTAINING AT LEAST ONE OF HYDROGEN SULFIDE AND MERCAPTANS WHICH COMPRISES COMBINATION OF PEROXIDE, CHELATING AGENT AND NITRATE ION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2002-12-17 | — | — | US | claimed |
| US-11859119-B2 | Chemical liquid and method for treating object to be treated | FUJIFILM CORPORATION (JP) | 2024-01-02 | — | — | US | disclosed |
| US-20230159864-A1 | TREATMENT LIQUID AND METHOD FOR TREATING OBJECT TO BE TREATED | FUJIFILM CORPORATION (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20220002622-A1 | CHEMICAL LIQUID AND METHOD FOR TREATING OBJECT TO BE TREATED | FUJIFILM CORPORATION (JP) | 2022-01-06 | — | — | US | disclosed |
| US-10106736-B2 | Etching agent for semiconductor substrate | SETTSU OIL MILL., INC. (JP) | 2018-10-23 | — | — | US | disclosed |
| US-20170306229-A1 | ETCHING AGENT FOR SEMICONDUCTOR SUBSTRATE | SETTSU OIL MILL., INC. (JP) | 2017-10-26 | — | — | US | disclosed |
| US-9334470-B2 | Cleaning liquid composition for electronic device | KANTO KAGAKU KABUSHIKI KAISHA (JP) | 2016-05-10 | — | — | US | disclosed |
| EP-2602309-A1 | Cleaning alkaline liquid composition for electronic device comprising a phosphonic acid derivative chelating agent | Kanto Kagaku Kabushiki Kaisha (JP) | 2013-06-12 | — | — | EP | disclosed |
| US-20130143785-A1 | CLEANING LIQUID COMPOSITION FOR ELECTRONIC DEVICE | KANTO KAGAKU KABUSHIKI KAISHA (JP) | 2013-06-06 | — | — | US | disclosed |
| US-6495096-B1 | DEODORANT FOR SUBSTANCES CONTAINING AT LEAST ONE OF HYDROGEN SULFIDE AND MERCAPTANS WHICH COMPRISES COMBINATION OF PEROXIDE, CHELATING AGENT AND NITRATE ION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2002-12-17 | — | — | US | disclosed |
| EP-0560324-B1 | Cleaning fluid for semiconductor substrate | MITSUBISHI GAS CHEMICAL CO (JP) | 1998-08-19 | — | — | EP | disclosed |
| US-5705089-A | HYDROGEN PEROXIDE, PHOSPHONIC ACID CHELATEING AGENT, WETTING AGENT | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1998-01-06 | — | — | US | disclosed |
| EP-0560324-A1 | Cleaning fluid for semiconductor substrate | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1993-09-15 | — | — | EP | disclosed |