Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC1A3 | P43003 | 1/20 | 0.30 |
| ▸ | SLC1A2 | P43004 | 1/20 | 0.30 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7722568 | 1.00 | SLC1A3 (0.30) | SLC1A3SLC1A2SLC1A1 | |
| SCHEMBL7961246 | 0.81 | SLC1A3 (0.32) | SLC1A3SLC1A2SLC1A1 | |
| SCHEMBL8683289 | 0.80 | TSHR (0.39) | SLC1A3SLC1A2SLC1A1 | |
| SCHEMBL5574716 | 0.76 | — | — | |
| SCHEMBL310232 | 0.76 | — | — | |
| SCHEMBL5918859 | 0.76 | — | — | |
| SCHEMBL5918865 | 0.76 | — | — | |
| SCHEMBL310233 | 0.76 | — | — | |
| SCHEMBL5574712 | 0.76 | — | — | |
| SCHEMBL14528313 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3088955-B1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2020-06-03 | — | — | EP | disclosed |
| CN-106094450-B | Resist composition and patterning method | 信越化学工业株式会社 | 2020-05-05 | — | — | CN | disclosed |
| US-9921479-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-20 | — | — | US | disclosed |
| CN-106094450-A | Anti-corrosion agent composition and patterning method | 信越化学工业株式会社 | 2016-11-09 | — | — | CN | disclosed |
| US-20160320699-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-11-03 | — | — | US | disclosed |
| EP-3088955-A2 | RESIST COMPOSITION AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2016-11-02 | — | — | EP | disclosed |
| US-6395453-B1 | USING AN A,B UNSATURATED KETONE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-05-28 | — | — | US | disclosed |