⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10424640 | 0.93 | — | — | |
| SCHEMBL4192013 | 0.80 | — | — | |
| SCHEMBL9995851 | 0.69 | — | — | |
| SCHEMBL11051761 | 0.69 | — | — | |
| SCHEMBL333316 | 0.69 | — | — | |
| SCHEMBL662435 | 0.69 | — | — | |
| SCHEMBL11254984 | 0.67 | — | — | |
| SCHEMBL17666835 | 0.67 | — | — | |
| SCHEMBL9813721 | 0.67 | — | — | |
| SCHEMBL11254990 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105074514-A | Polarizing plate | SUMITOMO CHEMICAL CO | 2015-11-18 | — | — | CN | disclosed |
| CN-102967995-A | Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing same, process for making relief printing plate, and relief printing plate | FUJIFILM CORP | 2013-03-13 | — | — | CN | disclosed |
| CN-102540713-A | Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing same, and process for making relief printing plate | FUJIFILM CORP | 2012-07-04 | — | — | CN | disclosed |
| US-6413448-B1 | ESTERS; DOPANTS; LONGER CHIRAL SMECTIC PHASE PITCH; HIGHER TILT ANGLE; LOWER VISCOSITY; CRYSTALLIZATION SUPPRESSION; IMPROVED SOLUBILITY; BROADER C* PHASE TEMPERATURE RANGE | DISPLAYTECH, INC. | 2002-07-02 | — | — | US | disclosed |
| WO-2000065801-A9 | CYCLOHEXYL- AND CYCLOHEXENYL-SUBSTITUTED LIQUID CRYSTALS WITH LOW BIREFRINGENCE | DISPLAYTECH INC (US) | 2001-04-12 | — | — | WO | disclosed |
| EP-0777152-B1 | Silver halide color photographic light-sensitive material | FUJI PHOTO FILM CO LTD (JP) | 2001-03-14 | — | — | EP | disclosed |
| WO-2000065801-A1 | CYCLOHEXYL- AND CYCLOHEXENYL-SUBSTITUTED LIQUID CRYSTALS WITH LOW BIREFRINGENCE | DISPLAYTECH, INC. (US) | 2000-11-02 | — | — | WO | disclosed |
| WO-2000002864-A1 | PRECUSORS FOR PNA-MONOMERS | MARTENS JUERGEN (DE) | 2000-01-20 | — | — | WO | disclosed |
| EP-0777152-A1 | Silver halide color photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1997-06-04 | — | — | EP | disclosed |
| US-4313979-A | ADDING SOLVENT TO SOFTEN THE ACRYLIC PRIMER LAYER | GENERAL ELECTRIC COMPANY (US) | 1982-02-02 | — | — | US | disclosed |