⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6763116 | 1.00 | — | — | |
| Bicarbonate SCHEMBL27129096 | 0.88 | TDP1 (0.40) | — | |
| SCHEMBL27469532 | 0.73 | — | — | |
| SCHEMBL10615832 | 0.71 | — | — | |
| SCHEMBL6407003 | 0.71 | — | — | |
| SCHEMBL14890367 | 0.71 | — | — | |
| SCHEMBL10615824 | 0.71 | — | — | |
| Water SCHEMBL27714458 | 0.71 | — | — | |
| SCHEMBL669050 | 0.69 | — | — | |
| SCHEMBL168758 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117331270-A | Projection lens | 宜宾市极米光电有限公司 | 2024-01-02 | — | — | CN | disclosed |
| US-10651286-B2 | High selectivity nitride removal process based on selective polymer deposition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2020-05-12 | — | — | US | disclosed |
| US-20190305109-A1 | HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER DEPOSITION | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2019-10-03 | — | — | US | disclosed |
| US-10325998-B2 | High selectivity nitride removal process based on selective polymer deposition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2019-06-18 | — | — | US | disclosed |
| US-10269924-B2 | High selectivity nitride removal process based on selective polymer deposition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2019-04-23 | — | — | US | disclosed |
| CN-105408322-B | Terazololine-one compound and application thereof | 住友化学株式会社 | 2019-04-19 | — | — | CN | disclosed |
| CN-105143377-B | Pressure-sensitive adhesive film and method for manufacturing organic electronic device using the same | LG化学株式会社 | 2018-05-25 | — | — | CN | disclosed |
| CN-105593217-B | Terazololine-one compound and application thereof | 住友化学株式会社 | 2018-05-25 | — | — | CN | disclosed |
| CN-105636957-B | Terazololine-one compound and application thereof | 住友化学株式会社 | 2018-05-11 | — | — | CN | disclosed |
| CN-105392779-B | Tetrazolinone compound and use thereof | 住友化学株式会社 | 2018-01-19 | — | — | CN | disclosed |
| US-8765613-B2 | High selectivity nitride etch process | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-07-01 | — | — | US | disclosed |
| WO-2013063182-A1 | HIGH SELECTIVITY NITRIDE ETCH PROCESS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-05-02 | — | — | WO | disclosed |
| US-20130105996-A1 | LOW ENERGY ETCH PROCESS FOR NITROGEN-CONTAINING DIELECTRIC LAYER | ZEON CORPORATION (JP) | 2013-05-02 | — | — | US | disclosed |
| US-20130105916-A1 | HIGH SELECTIVITY NITRIDE ETCH PROCESS | ZEON CORPORATION (JP) | 2013-05-02 | — | — | US | disclosed |
| US-20130108833-A1 | HIGH FIDELITY PATTERNING EMPLOYING A FLUOROHYDROCARBON-CONTAINING POLYMER | ZEON CORPORATION (JP) | 2013-05-02 | — | — | US | disclosed |
| WO-2013063179-A1 | LOW ENERGY ETCH PROCESS FOR NITROGEN-CONTAINING DIELECTRIC LAYER | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-05-02 | — | — | WO | disclosed |
| WO-2013062985-A1 | HIGH FIDELITY PATTERNING EMPLOYING A FLUOROHYDROCARBON-CONTAINING POLYMER | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-05-02 | — | — | WO | disclosed |
| US-6407041-B1 | HERBICIDES | BAYER AKTIENGESELLSCHAFT (DE) | 2002-06-18 | — | — | US | disclosed |
| EP-1037882-A1 | SUBSTITUTED 2,4-DIAMINO-1,3,5-TRIAZINES | BAYER AG (DE) | 2000-09-27 | — | — | EP | disclosed |
| WO-1999029677-A1 | SUBSTITUTED 2,4-DIAMINO-1,3,5-TRIAZINES | BAYER AKTIENGESELLSCHAFT (DE) | 1999-06-17 | — | — | WO | disclosed |