SCHEMBL7740414

SCHEMBL7740414

CO[Si](C)(OC)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1638789 0.97
SCHEMBL16980579 0.91
SCHEMBL19499982 0.89
SCHEMBL14183061 0.88
SCHEMBL15678739 0.88
SCHEMBL26372510 0.88
SCHEMBL11291008 0.87
SCHEMBL12799182 0.86
SCHEMBL19168534 0.85
SCHEMBL768193 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8633276-B2 Thermally conductive silicone composition and electronic device DOW CORNING TORAY COMPANY, LTD. (JP) 2014-01-21 US disclosed
US-20110188213-A1 THERMALLY CONDUCTIVE SILICONE COMPOSITION AND ELECTRONIC DEVICE DOW TORAY CO., LTD. (JP) 2011-08-04 US disclosed
US-6417310-B1 CONDENSATION POLYMERIZATION OF BRANCHED AND LOW MOLECULAR WEIGHT POLYSILOXANES USING ACID OR BASIC CATALYST; ADDING SURFACTANT, DISPERSION, AND EMULSION POLYMERIZATION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-07-09 US disclosed
US-6245852-B1 EMULSIFICATION, DISPERSING LOW MOLECULAR WEIGHT POLYSILOXANE, WATER, ANIONIC SURFACTANT; HIGH SHEAR PRESSURE; NEUTRALIZATON SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-06-12 US disclosed