SCHEMBL774079

SCHEMBL774079

CC(=N)N=N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27388112 0.74
SCHEMBL3071837 0.70
SCHEMBL21553907 0.70
SCHEMBL3071836 0.70
SCHEMBL2291827 0.67
SCHEMBL15172858 0.67
SCHEMBL11414400 0.67
SCHEMBL14448430 0.67
SCHEMBL2338265 0.67
SCHEMBL6652973 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3137470-B1 COMPOUNDS AND COMPOSITIONS AS TOLL-LIKE RECEPTOR 7 AGONISTS NOVARTIS AG (CH) 2021-04-07 EP disclosed
EP-2393806-B1 INHIBITORS OF JUN N-TERMINAL KINASE ELAN PHARM INC (US) 2017-10-25 EP disclosed
US-8637434-B2 System for photolithographic synthesis of polymer arrays AFFYMETRIX, INC. (US) 2014-01-28 US disclosed
US-20130059763-A1 System for photolithographic synthesis of polymer arrays AFFYMETRIX, INC. (US) 2013-03-07 US disclosed
US-8309496-B2 Methods for photolithographic synthesis of polymer arrays utilizing anti-reflective coatings AFFYMETRIX, INC. (US) 2012-11-13 US disclosed
US-20120071361-A1 Substrate Preparation Process AFFYMETRIX, INC. (US) 2012-03-22 US disclosed
US-8067578-B2 Substrate preparation process AFFYMETRIX, INC. (US) 2011-11-29 US disclosed
US-20100331217-A1 SUBSTRATE PREPARATION PROCESS AFFYMETRIX, INC. (US) 2010-12-30 US disclosed
US-20100298171-A1 APPARATUS FOR POLYMER SYNTHESIS AFFYMETRIX, INC. (US) 2010-11-25 US disclosed
US-7833331-B2 Non-toxic corrosion-protection pigments based on cobalt UNIVERSITY OF DAYTON (US) 2010-11-16 US disclosed
US-20040011252-A1 Non-toxic corrosion-protection pigments based on manganese UNIVERSITY OF DAYTON 2004-01-22 US disclosed
US-20030234063-A1 Non-toxic corrosion-protection conversion coats based on cobalt DAYTON, UNIVERSITY OF 2003-12-25 US disclosed
US-20030230363-A1 Non-toxic corrosion-protection rinses and seals based on cobalt UNIVERSITY OF DAYTON 2003-12-18 US disclosed
WO-2003060192-A1 NON-TOXIC CORROSION-PROTECTION RINSES AND SEALS BASED ON COBALT UNIVERSITY OF DAYTON (US) 2003-07-24 WO disclosed
WO-2003060191-A2 NON-TOXIC CORROSION-PROTECTION CONVERSION COATINGES ABSED ON COBALT UNIVERSITY OF DAYTON (US) 2003-07-24 WO disclosed
WO-2003060019-A1 NON-TOXIC CORROSION PROTECTION PIGMENTS BASED ON COBALT UNIVERSITY OF DAYTON (US) 2003-07-24 WO disclosed
US-6307042-B1 GENERATING NUCLEOTIDE SEQUENCES; PROVIDE SUBSTRATE WAFERS, REMOVE PROTECTED GROUPS, TRANSFER SUBSTRATE WAFERS TO COUPLING STATION, TRANSFER SUBSTRATE WAFER TO ACTIVATION STATION, ANALYZE POLYMER LAYOUTS AFFYMETRIX, INC. 2001-10-23 US disclosed
EP-0950112-A1 PHOTOLABILE POLYMER ARRAY SYNTHESIS METHODS Affymetrix, Inc. (a California Corporation) (US) 1999-10-20 EP disclosed
US-5959098-A ACTIVATING AND COUPLING MONOMERS IN DIFFERENT SELECTED ZONES OF SUBSTRATE FORMING DIFFERENT SEQUENCES IN DIFFERENT AREAS; ACTIVATING BY DIRECTING RADIATION AT SURFACE OF SUBSTRATE WITH FUNCTIONAL GROUPS PROTECTED BY PHOTOLABILE GROUPS AFFYMETRIX, INC. (US) 1999-09-28 US disclosed
WO-1997039151-A1 PHOTOLABILE POLYMER ARRAY SYNTHESIS METHODS AFFYMETRIX, INC. (US) 1997-10-23 WO disclosed