Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.58 |
| ▸ | THRB | P10828 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | APEX1 | P27695 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | ITGB3 | P05106 | 1/20 | 0.31 |
| ▸ | ITGA2B | P08514 | 1/20 | 0.31 |
| ▸ | BHMT | Q93088 | 1/20 | 0.30 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15372542 | 0.96 | TSHR (0.62) | TSHRTHRBALDH1A1POLBAPEX1 | |
| SCHEMBL20006488 | 0.83 | TSHR (0.64) | TSHRTHRBALDH1A1POLBAPEX1 | |
| SCHEMBL3319370 | 0.82 | TSHR (0.75) | TSHRTHRBALDH1A1POLBAPEX1 | |
| Methacrylic Acid SCHEMBL1472434 | 0.81 | TSHR (0.88) | TSHRTHRBALDH1A1POLBAPEX1 | |
| SCHEMBL20001266 | 0.81 | TSHR (0.72) | TSHRTHRBALDH1A1POLBAPEX1 | |
| Methacrylic Acid SCHEMBL1076438 | 0.79 | TSHR (0.64) | TSHRTHRBALDH1A1POLBAPEX1 | |
| SCHEMBL4526188 | 0.79 | TSHR (0.69) | TSHRTHRBALDH1A1POLBAPEX1 | |
| SCHEMBL31059270 | 0.79 | TSHR (0.69) | TSHRTHRBALDH1A1POLBAPEX1 | |
| SCHEMBL13114671 | 0.78 | TSHR (0.57) | TSHRTHRBALDH1A1 | |
| SCHEMBL1673788 | 0.77 | TSHR (0.67) | TSHRTHRBALDH1A1POLBAPEX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6329125-B2 | AN ALKALI-INSOLUBLE COMPOUND HAVING A PROTECTED ALKALI SOLUBLE GROUP IN WHICH PROTECTIVE GROUP CONTAINS AN ALICYCLIC HYDROCARBON GROUP HAVING BONDED TO A CARBON ATOM AND CLEAVED UPON ACTION OF AN ACID GENERATED FROM A PHOTOACID GEENERATOR | FUJITSU LIMITED (JP) | 2001-12-11 | — | — | US | disclosed |
| US-20010003640-A1 | Chemically amplified resist compositions and process for the formation of resist patterns | FUJITSU LIMITED (JP) | 2001-06-14 | — | — | US | disclosed |
| US-6200725-B1 | A SUBSTITUTED ALICYCLIC HYDROCARBON GROUP WHICH ACTS AS A PROTECTIVE GROUP TO AN ADDITIONAL POLYMER WHEN EXPOSED TO A POLYACID GENERATOR WHICH IS CAPABLE OF DECOMPOSING TO PATTERN RADIATION EPOSURE, PRODUCES ACID, CAPABLE OF DEPROTECTION | FUJITSU LIMITED (JP) | 2001-03-13 | — | — | US | disclosed |
| US-6013416-A | FILMS FOR PHOTORESISTS PATTERNS | FUJITSU LIMITED (JP) | 2000-01-11 | — | — | US | disclosed |
| US-5968713-A | ALKALI DEVELOPED RESISTS AND FILM FORMING COMPOUNDS WITH ALKALI SOLUBLE GROUPS AND GENERATION | FUJITSU LIMITED (JP) | 1999-10-19 | — | — | US | disclosed |