SCHEMBL7745863

SCHEMBL7745863

CCCCc1cc2ccccc2c(C(=O)O)c1CCCC

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.51
MEN1 O00255 1/20 0.51
ALDH1A1 P00352 1/20 0.51
CYP1A2 P05177 1/20 0.51
GLA P06280 1/20 0.51
HPGD P15428 1/20 0.51
CYP2C19 P33261 1/20 0.51
KMT2A Q03164 1/20 0.51
HSD17B10 Q99714 1/20 0.51
ME2 P23368 1/20 0.48
ME1 P48163 1/20 0.48
ME3 Q16798 1/20 0.48
BID P55957 3/20 0.43
MCL1 Q07820 3/20 0.43
BCL2L1 Q07817 2/20 0.43
BAK1 Q16611 2/20 0.43
KAT8 Q9H7Z6 2/20 0.43
PPARA Q07869 2/20 0.43
PPARG P37231 1/20 0.43
EP300 Q09472 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7594370 0.96 KDM4E (0.50) KDM4EMEN1ALDH1A1CYP1A2GLA
SCHEMBL163402 0.94 BID (0.51) KDM4EMEN1ALDH1A1CYP1A2GLA
SCHEMBL1176173 0.94 BID (0.51) KDM4EMEN1ALDH1A1CYP1A2GLA
SCHEMBL27266684 0.94 BID (0.51) KDM4EMEN1ALDH1A1CYP1A2GLA
Ammonia Solution, Strong SCHEMBL7713469 0.93 BID (0.50) KDM4EMEN1ALDH1A1CYP1A2GLA
SCHEMBL27715457 0.93 BID (0.50) KDM4EMEN1ALDH1A1CYP1A2GLA
Ammonia Solution, Strong SCHEMBL7713467 0.93 BID (0.50) KDM4EMEN1ALDH1A1CYP1A2GLA
SCHEMBL28277939 0.93 BID (0.50) KDM4EMEN1ALDH1A1CYP1A2GLA
Ammonia Solution, Strong SCHEMBL7718996 0.87 KDM4E (0.53) KDM4EMEN1ALDH1A1CYP1A2GLA
Ammonia Solution, Strong SCHEMBL7718997 0.87 KDM4E (0.53) KDM4EMEN1ALDH1A1CYP1A2GLA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109143783-B Coating compositions for use with overcoated photoresists 罗门哈斯电子材料韩国有限公司 2022-04-29 CN disclosed
JP-2001003102-A PLASTIC COMPOSITION OF NOBLE METAL EXCELLENT IN MOLDABILITY AND SHAPE-HOLDING PROPERTY MITSUBISHI MATERIALS CORP 2001-01-09 JP disclosed
US-5163994-A Crosslinked macroporous styrene and/or divinylbenzene carrier, sustained release BASF AKTIENGESELLSCHAFT (DE) 1992-11-17 US disclosed
US-4810609-A ELECTROGRAPHY MINOLTA CAMERA KABUSHIKI KAISHA (JP) 1989-03-07 US disclosed
CN-86104887-A (R)-2-[4-(5-chloro-3-fluorine pyridine-2-base oxygen) phenoxy group] the propionic acid propargyl ester the preparation method and as herbicide applications 1987-12-23 CN disclosed
EP-0070254-B1 PHOTOGRAPHIC MATERIAL CONTAINING A DEVELOPMENT ACCELERATOR CIBA-GEIGY AG (CH) 1985-10-16 EP disclosed
EP-0070254-A1 Photographic material containing a development accelerator CIBA-GEIGY AG (CH) 1983-01-19 EP disclosed
US-4072776-A PHOSPHOROUS CONTAINING ACRYLIC ACID ESTERS HOECHST AKTIENGESELLSCHAFT (DT) 1978-02-07 US disclosed