⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27455518 | 1.00 | — | — | |
| SCHEMBL11489226 | 0.82 | — | — | |
| SCHEMBL28526693 | 0.82 | — | — | |
| SCHEMBL10802615 | 0.82 | — | — | |
| SCHEMBL2258068 | 0.82 | — | — | |
| SCHEMBL11489224 | 0.82 | — | — | |
| SCHEMBL7721188 | 0.82 | — | — | |
| SCHEMBL5623577 | 0.82 | — | — | |
| SCHEMBL1188776 | 0.82 | — | — | |
| SCHEMBL29059854 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 187 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12517423-B2 | Extreme ultraviolet mask with alloy based absorbers | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2026-01-06 | — | — | US | claimed |
| CN-116103554-B | Stainless steel chromium tantalum alloy material, stainless steel soaking plate and preparation method and application thereof | 北京酷捷科技有限公司 | 2025-01-24 | — | — | CN | claimed |
| US-12181797-B2 | Extreme ultraviolet mask with alloy based absorbers | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2024-12-31 | — | — | US | claimed |
| US-12153337-B2 | Extreme ultraviolet mask with tantalum base alloy absorber | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2024-11-26 | — | — | US | claimed |
| CN-118639227-A | Electric spark deposition preparation method of chromium-tantalum coating containing nanocrystalline tissues | 沈阳理工大学 | 2024-09-13 | — | — | CN | claimed |
| US-20240192581-A1 | EXTREME ULTRAVIOLET MASK WITH TANTALUM BASE ALLOY ABSORBER | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2024-06-13 | — | — | US | claimed |
| CN-116103554-A | Stainless steel chromium tantalum alloy material, stainless steel soaking plate and preparation method and application thereof | 北京酷捷科技有限公司 | 2023-05-12 | — | — | CN | claimed |
| US-11597985-B2 | Aluminum alloy composition and manufacturing method thereof | DELTA ELECTRONICS, INC. (TW) | 2023-03-07 | — | — | US | claimed |
| CN-113201673-B | Aluminum alloy composition and method for producing same | 台达电子工业股份有限公司 | 2022-07-26 | — | — | CN | claimed |
| CN-106024028-B | Iridium underlayer for heat assisted magnetic recording media | 西部数据传媒公司 | 2019-04-12 | — | — | CN | claimed |
| CN-1637867-A | Magnetic recording medium | HITACHI GLOBAL STORAGE TECH (NL) | 2005-07-13 | — | — | CN | claimed |
| US-6869736-B2 | Halftone phase shift photomask and blank for halftone phase shift photomask | DAI NIPPON PRINTING CO., LTD. (JP) | 2005-03-22 | — | — | US | claimed |
| US-20030186135-A1 | Halftone phase shift photomask and blank for halftone phase shift photomask | DAI NIPPON PRINTING CO., LTD. (JP) | 2003-10-02 | — | — | US | claimed |
| EP-1321820-A1 | HALFTONE PHASE SHIFT PHOTOMASK AND BLANK FOR HALFTONE PHASE SHIFT PHOTOMASK | DAI NIPPON PRINTING CO., LTD. (JP) | 2003-06-25 | — | — | EP | claimed |
| US-6414095-B1 | CONTACTING UNDER POLYMERIZATION CONDITIONS ONE OR MORE OLEFINS AND SUPPORTED CATALYST SYSTEM COMPRISING PRODUCT OF ONE OR MORE SUPPORT MATERIALS, ONE OR MORE ACTIVATORS, AND ONE OR MORE METALLOCENE COMPOUNDS | EXXON MOBIL CHEMICAL PATENTS INC. | 2002-07-02 | — | — | US | claimed |
| US-20020068430-A1 | Methods of forming void regions, dielectric regions and capacitor constructions | ELDRIDGE JEROME MICHAEL (US) | 2002-06-06 | — | — | US | claimed |
| US-20010026432-A1 | Protector device | KABUSHIKI KAISHA MECHATRO GIKEN (JP) | 2001-10-04 | — | — | US | claimed |
| EP-1139528-A1 | Protector device | KABUSHIKI KAISHA MECHATRO GIKEN (JP) | 2001-10-04 | — | — | EP | claimed |
| US-6140200-A | Methods of forming void regions dielectric regions and capacitor constructions | MICRON TECHNOLOGY, INC. (US) | 2000-10-31 | — | — | US | claimed |
| EP-0801293-B1 | Pressure sensor or differential pressure sensor | GRUNDFOS AS (DK) | 2000-07-05 | — | — | EP | claimed |