Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL775044 | 0.93 | F2 (0.33) | F2 | |
| SCHEMBL775161 | 0.84 | F2 (0.34) | F2 | |
| SCHEMBL12764325 | 0.81 | CHRM2 (0.34) | FAAH | |
| SCHEMBL775043 | 0.78 | HTT (0.31) | F2 | |
| SCHEMBL775415 | 0.78 | F2 (0.33) | F2 | |
| SCHEMBL775280 | 0.77 | — | — | |
| SCHEMBL774836 | 0.76 | HTT (0.34) | F2 | |
| SCHEMBL9915989 | 0.75 | HTT (0.36) | F2 | |
| SCHEMBL12764327 | 0.74 | CHRM2 (0.35) | — | |
| SCHEMBL775031 | 0.74 | F2 (0.35) | F2FAAH |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120070778-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-03-22 | — | — | US | disclosed |
| US-20120070778-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-03-22 | — | — | US | disclosed |