SCHEMBL7758296

SCHEMBL7758296

[CH2]C[Si](OC(C)C)(OC(C)C)OC(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1889232 0.77
SCHEMBL430819 0.73
SCHEMBL429418 0.73
SCHEMBL4082958 0.73
SCHEMBL105222 0.71
SCHEMBL12098909 0.71
SCHEMBL6550291 0.69
SCHEMBL545662 0.69
SCHEMBL15313196 0.69
SCHEMBL1262934 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115991877-A Rubber-plastic composite material and application thereof in new energy automobile tires 广东粤港澳大湾区黄埔材料研究院 2023-04-21 CN claimed
CN-115991877-B Rubber-plastic composite material and application thereof in new energy automobile tires 广东粤港澳大湾区黄埔材料研究院 2023-07-07 CN disclosed
CN-115991877-A Rubber-plastic composite material and application thereof in new energy automobile tires 广东粤港澳大湾区黄埔材料研究院 2023-04-21 CN disclosed
US-11608447-B2 Material for cell patterning use THE UNIVERSITY OF TOYAMA (JP) 2023-03-21 US disclosed
US-20190322784-A1 MATERIAL FOR CELL PATTERNING USE OSAKA ORGANIC CHEMICAL INDUSTRY LTD. (JP) 2019-10-24 US disclosed
US-10125242-B2 Organosilicon compound, curable silicone composition, and semiconductor device DOW CORNING TORAY CO., LTD. (JP) 2018-11-13 US disclosed
US-20170190878-A1 Organic Silicon Compound, Curable Silicone Composition, And Semiconductor Device DOW TORAY CO., LTD. (JP) 2017-07-06 US disclosed
EP-3153516-A1 ORGANIC SILICON COMPOUND, CURABLE SILICONE COMPOSITION, AND SEMICONDUCTOR DEVICE Dow Corning Toray Co., Ltd. (JP) 2017-04-12 EP disclosed
WO-2001085737-A1 METHOD FOR THE PRODUCTION OF SILICON- OR GERMANIUM-SUBSTITUTED AMINES WACKER-CHEMIE GMBH (DE) 2001-11-15 WO disclosed