⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19732674 | 0.82 | — | — | |
| SCHEMBL23282538 | 0.82 | — | — | |
| SCHEMBL9850941 | 0.80 | — | — | |
| SCHEMBL775012 | 0.80 | — | — | |
| SCHEMBL1136084 | 0.80 | — | — | |
| SCHEMBL11905534 | 0.80 | KDM4C (0.36) | — | |
| SCHEMBL105096 | 0.75 | — | — | |
| SCHEMBL329633 | 0.74 | — | — | |
| SCHEMBL1070576 | 0.74 | — | — | |
| SCHEMBL5916621 | 0.74 | CHRM1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8709959-B2 | Puncture resistant fabric | KIMBERLY-CLARK WORLDWIDE, INC. (US) | 2014-04-29 | — | — | US | claimed |
| US-12606576-B2 | Method for producing nitrogen-containing organoxysilane compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-21 | — | — | US | disclosed |
| EP-4620960-A1 | COMPOSITION CONTAINING AMINOALKYL ALKOXY DISILOXANE COMPOUND AND AMINOALKYL ALKOXY OLIGOSILOXANE COMPOUND, AND METHOD FOR PRODUCING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-24 | — | — | EP | disclosed |
| US-12018123-B2 | Diterminally amine-modified perfluoropolyether compound and preparation thereof, and liquid-repelling composition, cured product and coated substrate containing the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-25 | — | — | US | disclosed |
| EP-4006042-B1 | METHOD FOR PRODUCING NITROGEN-CONTAINING ORGANOXYSILANE COMPOUND | SHINETSU CHEMICAL CO (JP) | 2024-01-31 | — | — | EP | disclosed |
| WO-2023189388-A1 | RUBBER COMPOSITION FOR HEAVY-DUTY TIRES | ＺＳエラストマー株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023162617-A1 | RUBBER COMPOSITION FOR HEAVY-LOAD TIRE | ＺＳエラストマー株式会社 | 2023-08-31 | — | — | WO | disclosed |
| WO-2023162618-A1 | RUBBER COMPOSITION FOR SIDEWALL | ＺＳエラストマー株式会社 | 2023-08-31 | — | — | WO | disclosed |
| EP-3950774-B1 | DITERMINALLY AMINE-MODIFIED PERFLUOROPOLYETHER COMPOUND AND PREPARATION THEREOF, AND LIQUID-REPELLING COMPOSITION, CURED PRODUCT AND COATED SUBSTRATE CONTAINING THE SAME | SHINETSU CHEMICAL CO (JP) | 2022-10-05 | — | — | EP | disclosed |
| CN-114573630-A | Method for producing nitrogen-containing organooxysilane compound | 信越化学工业株式会社 | 2022-06-03 | — | — | CN | disclosed |
| US-20090260297-A1 | Hydrophilic and hydrophobic silane surface modification of abrasive grains | SAINT-GOBAIN ABRASIFS (FR) | 2009-10-22 | — | — | US | disclosed |
| EP-2087047-A2 | METAL EFFECT PIGMENTS FOR USE IN THE CATHODIC ELECTRODEPOSITION PAINTING, METHOD FOR THE PRODUCTION AND USE OF THE SAME, AND ELECTRODEPOSITION PAINT | Eckart GmbH (DE) | 2009-08-12 | — | — | EP | disclosed |
| EP-1302444-B1 | Silica with low content of silanol groups | WACKER CHEMIE AG (DE) | 2009-06-10 | — | — | EP | disclosed |
| US-20080113162-A1 | Reactive Silicic Acid Suspensions | WACKER CHEMIE AG (DE) | 2008-05-15 | — | — | US | disclosed |
| WO-2008052720-A2 | METAL EFFECT PIGMENTS FOR USE IN THE CATHODIC ELECTRODEPOSITION PAINTING, METHOD FOR THE PRODUCTION AND USE OF THE SAME, AND ELECTRODEPOSITION PAINT | ECKART GMBH (DE) | 2008-05-08 | — | — | WO | disclosed |
| EP-1831301-A1 | REACTIVE SILICIC ACID SUSPENSIONS | Wacker Chemie AG (DE) | 2007-09-12 | — | — | EP | disclosed |
| WO-2006072407-A1 | REACTIVE SILICIC ACID SUSPENSIONS | WACKER CHEMIE AG (DE) | 2006-07-13 | — | — | WO | disclosed |
| US-6800413-B2 | LOADING/REACTING HYDROPHILIC PYROGENIC SILICA WITH SILYLATING AGENT (METHYLTRICHLOROSILANE), THEN PURIFYING WITH INERT GAS | WACKER-CHEMIE GMBH (DE) | 2004-10-05 | — | — | US | disclosed |
| US-20030138715-A1 | Low-silanol silica | WACKER-CHEMIE GMBH (DE) | 2003-07-24 | — | — | US | disclosed |
| EP-1302444-A1 | Silica with low content of silanol groups | Wacker-Chemie GmbH (DE) | 2003-04-16 | — | — | EP | disclosed |