⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17802510 | 0.87 | — | — | |
| SCHEMBL891750 | 0.72 | — | — | |
| SCHEMBL6890499 | 0.67 | — | — | |
| SCHEMBL331730 | 0.67 | — | — | |
| SCHEMBL332951 | 0.67 | — | — | |
| SCHEMBL309946 | 0.64 | — | — | |
| SCHEMBL706109 | 0.61 | — | — | |
| SCHEMBL7711909 | 0.61 | — | — | |
| SCHEMBL4917133 | 0.61 | — | — | |
| SCHEMBL705251 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107636844-B | Composition, device containing the composition, method for manufacturing the same, and method for improving battery efficiency | 欧提腾股份有限公司 | 2021-05-28 | — | — | CN | claimed |
| EP-4077339-B1 | CATALYST PARTICLES AND METHODS FOR DEHYDROGENATIVE SILYLATION | DOW SILICONES CORP (US) | 2026-05-13 | — | — | EP | disclosed |
| US-12371446-B2 | Catalyst particles and methods for dehydrogenative silylation | DOW SILICONES CORPORATION (US) | 2025-07-29 | — | — | US | disclosed |
| EP-4384392-A1 | METAL-PLATED LAMINATES CONTAINING POLYORGANOSILOXANES | Wacker Chemie AG (DE) | 2024-06-19 | — | — | EP | disclosed |
| CN-118119651-A | Method for producing low-silanol polyorganosiloxanes | 瓦克化学股份公司 | 2024-05-31 | — | — | CN | disclosed |
| CN-117720576-A | PSiSiP ligand, ethylene oligomerization catalyst, and preparation method and application thereof | 东北石油大学 | 2024-03-19 | — | — | CN | disclosed |
| CN-117651641-A | Metal-plated laminates containing polyorganosiloxanes | 瓦克化学股份公司 | 2024-03-05 | — | — | CN | disclosed |
| WO-2023051912-A1 | METHOD FOR PREPARING LOW-SILANOL POLYORGANOSILOXANES | WACKER CHEMIE AG (DE) | 2023-04-06 | — | — | WO | disclosed |
| WO-2023016649-A1 | METAL-PLATED LAMINATES CONTAINING POLYORGANOSILOXANES | WACKER CHEMIE AG (DE) | 2023-02-16 | — | — | WO | disclosed |
| US-20230042996-A1 | CATALYST PARTICLES AND METHODS FOR DEHYDROGENATIVE SILYLATION | DOW SILICONES CORPORATION | 2023-02-09 | — | — | US | disclosed |
| CN-102844342-A | Acrylonitrile-silazane copolymers, especially in fiber form, process for preparation thereof and use thereof | FRAUNHOFER GES FORSCHUNG | 2012-12-26 | — | — | CN | disclosed |
| CN-102464671-A | Process for producing alkoxy-substituted 1, 2-disilylethanes | WACKER CHEMIE AG | 2012-05-23 | — | — | CN | disclosed |
| CN-102449035-A | Hybrid polymers composed of cyanate and silazane, method for the production thereof, and use thereof | FRAUNHOFER GES FORSCHUNG | 2012-05-09 | — | — | CN | disclosed |
| CN-1120168-C | Catalyst activators comprising expanded anions | DOW WORLDWIDE TECHNOLOGY INC (US) | 2003-09-03 | — | — | CN | disclosed |
| EP-1103556-A1 | Process for preparing halogenated 1,2-disilaethane compounds | Wacker-Chemie GmbH (DE) | 2001-05-30 | — | — | EP | disclosed |
| CN-1290267-A | Catalyst activators comprising expanded anions | DOW CHEMICAL CO (US) | 2001-04-04 | — | — | CN | disclosed |
| US-5554706-A | LOW TEMPERATURE LIQUID CRYSTALS | SAGAMI CHEMICAL RESEARCH CENTER (JP) | 1996-09-10 | — | — | US | disclosed |
| CN-1031274-C | Process for preparing chlorine-containing silazane polymers | HOECHST AG (DE) | 1996-03-13 | — | — | CN | disclosed |
| EP-0695770-A1 | COPOLYMER HAVING LIQUID CRYSTAL GROUP IN THE SIDE CHAIN | SAGAMI CHEMICAL RESEARCH CENTER (JP) | 1996-02-07 | — | — | EP | disclosed |
| CN-1043322-A | Chloride silicon nitrogen silane copolymer, its preparation method is by its silicon nitride comprising stupalith that can prepare and the preparation of material | HOECHST AG (DE) | 1990-06-27 | — | — | CN | disclosed |