SCHEMBL776829

SCHEMBL776829

CCCCOS(=O)(=O)CC

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 13/20 0.61
CA2 P00918 13/20 0.61
CA9 Q16790 10/20 0.52
CA12 O43570 4/20 0.50
CA7 P43166 4/20 0.50
CA14 Q9ULX7 3/20 0.50
CA3 P07451 2/20 0.50
CA4 P22748 2/20 0.50
CA6 P23280 2/20 0.50
CA5A P35218 2/20 0.50
CA5B Q9Y2D0 2/20 0.50
TSHR P16473 3/20 0.48
RECQL P46063 2/20 0.48
GLA P06280 1/20 0.48
HPGD P15428 1/20 0.48
MAPK1 P28482 1/20 0.48
EPHX2 P34913 1/20 0.48
BLM P54132 1/20 0.48
ALDH1A1 P00352 2/20 0.43
KDM4E B2RXH2 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3190035 0.92 CA1 (0.62) CA1CA2CA9CA12CA7
SCHEMBL8375326 0.90 CA1 (0.64) CA1CA2CA9CA12CA7
SCHEMBL8377214 0.90 CA1 (0.64) CA1CA2CA9CA12CA7
SCHEMBL28961598 0.90 CA1 (0.64) CA1CA2CA9CA12CA7
SCHEMBL8710982 0.90 CA1 (0.64) CA1CA2CA9CA12CA7
SCHEMBL14762736 0.90 CA1 (0.64) CA1CA2CA9CA12CA7
SCHEMBL8376879 0.90 CA1 (0.64) CA1CA2CA9CA12CA7
SCHEMBL8710955 0.90 CA1 (0.64) CA1CA2CA9CA12CA7
SCHEMBL8376307 0.90 CA1 (0.64) CA1CA2CA9CA12CA7
SCHEMBL7132211 0.90 CA1 (0.64) CA1CA2CA9CA12CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4590777-A1 TUNGSTEN CMP COMPOSITION INCLUDING A SULFUR CONTAINING ANIONIC SURFACTANT CMC Materials LLC (US) 2025-07-30 EP claimed
CN-120153037-A Tungsten Chemical Mechanical Polishing (CMP) composition comprising sulfur-containing anionic surfactant CMC材料有限责任公司 2025-06-13 CN claimed
US-20240101865-A1 TUNGSTEN CMP COMPOSITION INCLUDING A SULFUR CONTAINING ANIONIC SURFACTANT CMC MATERIALS LLC 2024-03-28 US claimed
WO-2024064127-A1 TUNGSTEN CMP COMPOSITION INCLUDING A SULFUR CONTAINING ANIONIC SURFACTANT CMC MATERIALS LLC (US) 2024-03-28 WO claimed
CN-106905201-A A kind of double methacrylate and its synthetic method containing many fluorine chains 江苏理文化工有限公司 2017-06-30 CN claimed
CN-106905197-A A kind of fluorine-containing propene acid amides and its synthetic method 江苏理文化工有限公司 2017-06-30 CN claimed
CN-102827319-B The preparation method of a kind of vanadium series catalyst and preparation method thereof and ethylene-propylene copolymer CHANGCHUN INSTITUTE OF APPLIED CHEMISTRY CHINESE ACADEMY OF SCIENCES (CN) 2015-08-05 CN claimed
CN-102627708-B Preparation method for high-activity Ziegler Natta catalyst and application thereof CHANGCHUN APPLIED CHEMISTRY 2014-02-12 CN claimed
CN-102627712-B Preparation method and application of Ziegler Natta catalyst for propylene polymerization CHANGCHUN APPLIED CHEMISTRY 2014-02-12 CN claimed
CN-102617763-B Preparation method of ultrahigh molecular weight polyethylene CHANGCHUN APPLIED CHEMISTRY 2014-02-12 CN claimed
CN-102827319-A Vanadium catalyst and preparation method of vanadium catalyst as well as preparation method of ethylene-propylene copolymer CHANGCHUN APPLIED CHEMISTRY 2012-12-19 CN claimed
CN-102627712-A Preparation method and application of Ziegler Natta catalyst for propylene polymerization CHANGCHUN APPLIED CHEMISTRY 2012-08-08 CN claimed
CN-102627708-A Preparation method for high-activity Ziegler Natta catalyst and application thereof CHANGCHUN APPLIED CHEMISTRY 2012-08-08 CN claimed
CN-102617763-A Preparation method of ultrahigh molecular weight polyethylene CHANGCHUN APPLIED CHEMISTRY 2012-08-01 CN claimed
EP-1824827-B1 METHOD FOR PRODUCING ONIUM SALTS COMPRISING ALKYL ANIONS OR ARYL SULFONATE ANIONS OR ALKYL ANIONS OR ARYL CARBOXYLATE ANIONS HAVING A LOW HALIDE CONTENT MERCK PATENT GMBH (DE) 2008-09-17 EP claimed
CN-1558897-A oral antidiabetic agent ����-�����ع�˾ 2004-12-29 CN claimed
EP-4590777-A1 TUNGSTEN CMP COMPOSITION INCLUDING A SULFUR CONTAINING ANIONIC SURFACTANT CMC Materials LLC (US) 2025-07-30 EP disclosed
CN-120153037-A Tungsten Chemical Mechanical Polishing (CMP) composition comprising sulfur-containing anionic surfactant CMC材料有限责任公司 2025-06-13 CN disclosed
EP-0143968-A2 Polymeric electrode coated with reaction product or organosulfur compound AlliedSignal Inc. (US) 1985-06-12 EP disclosed
US-4472489-A SULTONE OR SULFONATE ALLIED CORPORATION (US) 1984-09-18 US disclosed