SCHEMBL7769588

SCHEMBL7769588

O=C(CCCCCCC(=O)c1ccc(O)cc1O)c1ccc(O)cc1O

nearest known ligand 0.80

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTT P42858 2/20 0.80
HSP90AB1 P08238 1/20 0.63
ESR1 P03372 1/20 0.59
SHBG P04278 1/20 0.59
ESR2 Q92731 1/20 0.59
CES2 O00748 1/20 0.57
KDM4E B2RXH2 1/20 0.56
ALDH1A1 P00352 5/20 0.55
TSHR P16473 2/20 0.55
CA12 O43570 1/20 0.55
CA1 P00915 1/20 0.55
CA2 P00918 1/20 0.55
CA7 P43166 1/20 0.55
CA9 Q16790 1/20 0.55
CA14 Q9ULX7 1/20 0.55
GFER P55789 1/20 0.53
LMNA P02545 5/20 0.53
SMN1; SMN2 Q16637 3/20 0.53
NPC1 O15118 2/20 0.53
RAB9A P51151 2/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7775763 1.00 HTT (0.80) HTTHSP90AB1ESR1SHBGESR2
SCHEMBL12896564 1.00 HTT (0.80) HTTHSP90AB1ESR1SHBGESR2
SCHEMBL7773876 1.00 HTT (0.80) HTTHSP90AB1ESR1SHBGESR2
SCHEMBL7775791 1.00 HTT (0.80) HTTHSP90AB1ESR1SHBGESR2
SCHEMBL10350385 0.98 HTT (0.83) HTTHSP90AB1ESR1SHBGESR2
SCHEMBL7391440 0.91 HTT (0.69) HTTHSP90AB1ESR1SHBGESR2
SCHEMBL3662077 0.91 HTT (0.97) HTTHSP90AB1ESR1SHBGESR2
SCHEMBL3659335 0.91 HTT (0.97) HTTHSP90AB1ESR1SHBGESR2
SCHEMBL3656872 0.91 HTT (0.97) HTTHSP90AB1ESR1SHBGESR2
SCHEMBL3654494 0.91 HTT (0.97) HTTHSP90AB1ESR1SHBGESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0445819-B1 Positive type photoresist composition FUJI PHOTO FILM CO LTD (JP) 2001-08-22 EP disclosed
EP-0445819-A2 Positive type photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1991-09-11 EP disclosed
US-4628020-A Light-sensitive compound mixture and copying material comprising o-naphthquinonediazide compound HOECHST AKTIENGESELLSCHAFT (DE) 1986-12-09 US disclosed
EP-0056092-A1 Light sensitive composition based on o-naphtoquinone diazides and light sensitive copying material produced therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1982-07-21 EP disclosed