Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.52 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.48 |
| ▸ | FFAR1 | O14842 | 2/20 | 0.48 |
| ▸ | CA1 | P00915 | 2/20 | 0.45 |
| ▸ | CA2 | P00918 | 2/20 | 0.45 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.44 |
| ▸ | FDPS | P14324 | 3/20 | 0.43 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7525601 | 1.00 | TP53 (0.52) | TP53GPR84FFAR1CA1CA2 | |
| SCHEMBL9822647 | 1.00 | TP53 (0.52) | TP53GPR84FFAR1CA1CA2 | |
| SCHEMBL29123958 | 1.00 | TP53 (0.52) | TP53GPR84FFAR1CA1CA2 | |
| SCHEMBL841752 | 1.00 | TP53 (0.52) | TP53GPR84FFAR1CA1CA2 | |
| SCHEMBL5888584 | 1.00 | TP53 (0.52) | TP53GPR84FFAR1CA1CA2 | |
| SCHEMBL3505684 | 1.00 | TP53 (0.52) | TP53GPR84FFAR1CA1CA2 | |
| SCHEMBL841574 | 1.00 | TP53 (0.52) | TP53GPR84FFAR1CA1CA2 | |
| SCHEMBL10591206 | 1.00 | TP53 (0.52) | TP53GPR84FFAR1CA1CA2 | |
| SCHEMBL28898937 | 1.00 | TP53 (0.52) | TP53GPR84FFAR1CA1CA2 | |
| SCHEMBL5888593 | 1.00 | TP53 (0.52) | TP53GPR84FFAR1CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107698641-B | DNA with terminal group modified by sulfur and preparation method thereof | 中国石油大学(华东) | 2020-05-26 | — | — | CN | claimed |
| US-9298095-B2 | Rinse solution for lithography and pattern formation method employing the same | MERCK PATENT GMBH (DE) | 2016-03-29 | — | — | US | claimed |
| US-20140234783-A1 | RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYING THE SAME | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2014-08-21 | — | — | US | claimed |
| CN-102348448-A | Thickening additive compositions | ISP INVESTMENTS INC | 2012-02-08 | — | — | CN | claimed |
| WO-2024204794-A1 | ETCHING LIQUID FOR SILICON NITRIDES, METHOD FOR PROCESSING SUBSTRATE AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT | 株式会社トクヤマ | 2024-10-03 | — | — | WO | disclosed |
| CN-114438347-B | Method for extracting and preparing high-purity vanadium oxide from high-chlorine vanadium-containing solution | 中国恩菲工程技术有限公司 | 2022-07-26 | — | — | CN | disclosed |
| CN-114438347-A | Method for extracting and preparing high-purity vanadium oxide from high-chlorine vanadium-containing solution | 中国恩菲工程技术有限公司 | 2022-05-06 | — | — | CN | disclosed |
| EP-3921402-A1 | IMPROVEMENTS RELATING TO FABRIC CLEANING | UNILEVER GLOBAL IP LIMITED (GB) | 2021-12-15 | — | — | EP | disclosed |
| EP-3921401-A1 | IMPROVEMENTS RELATING TO FABRIC CLEANING | UNILEVER GLOBAL IP LIMITED (GB) | 2021-12-15 | — | — | EP | disclosed |
| WO-2020160996-A1 | IMPROVEMENTS RELATING TO FABRIC CLEANING | UNILEVER PLC (GB) | 2020-08-13 | — | — | WO | disclosed |
| WO-2020160995-A1 | IMPROVEMENTS RELATING TO FABRIC CLEANING | UNILEVER PLC (GB) | 2020-08-13 | — | — | WO | disclosed |
| CN-107698641-B | DNA with terminal group modified by sulfur and preparation method thereof | 中国石油大学(华东) | 2020-05-26 | — | — | CN | disclosed |
| US-20140234783-A1 | RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYING THE SAME | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2014-08-21 | — | — | US | disclosed |
| EP-2711776-A1 | LITHOGRAPHY RINSING FLUID AND PATTERN FORMATION METHOD USING SAME | AZ Electronic Materials USA Corp. (US) | 2014-03-26 | — | — | EP | disclosed |
| CN-103443710-A | Lithography rinsing fluid and pattern formation method using same | AZ ELECTRONIC MATERIALS IP JAPAN K K | 2013-12-11 | — | — | CN | disclosed |
| CN-103421952-A | Synergic extraction agent and method for selectively extracting nickel in acidic nickeliferous solution through synergic extraction agent | UNIV CENTRAL SOUTH | 2013-12-04 | — | — | CN | disclosed |
| CN-202387254-U | Oil water separation device of raffinate | JIANGXI KINGAN HI TECH CO LTD | 2012-08-22 | — | — | CN | disclosed |
| CN-102348448-A | Thickening additive compositions | ISP INVESTMENTS INC | 2012-02-08 | — | — | CN | disclosed |
| EP-1124930-A1 | SPECKLE PARTICLES AND COMPOSITIONS CONTAINING THE SPECKLE PARTICLES | THE PROCTER & GAMBLE COMPANY (US) | 2001-08-22 | — | — | EP | disclosed |
| WO-2000027980-A1 | SPECKLE PARTICLES AND COMPOSITIONS CONTAINING THE SPECKLE PARTICLES | THE PROCTER & GAMBLE COMPANY (US) | 2000-05-18 | — | — | WO | disclosed |