Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 2/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.56 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.48 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.46 |
| ▸ | CA2 | P00918 | 2/20 | 0.46 |
| ▸ | CA12 | O43570 | 1/20 | 0.46 |
| ▸ | CA1 | P00915 | 1/20 | 0.46 |
| ▸ | CA4 | P22748 | 1/20 | 0.46 |
| ▸ | CA5A | P35218 | 1/20 | 0.46 |
| ▸ | CA7 | P43166 | 1/20 | 0.46 |
| ▸ | CA9 | Q16790 | 1/20 | 0.46 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28254358 | 0.96 | MEN1 (0.62) | MEN1KMT2AHIF1ACYP3A4NPSR1 | |
| SCHEMBL18334409 | 0.95 | MEN1 (0.51) | MEN1KMT2AHIF1ACYP3A4CA2 | |
| SCHEMBL11818661 | 0.95 | MEN1 (0.51) | MEN1KMT2AHIF1A | |
| SCHEMBL776511 | 0.94 | MEN1 (0.55) | MEN1KMT2AHIF1ANPSR1 | |
| SCHEMBL3463886 | 0.93 | MEN1 (0.53) | MEN1KMT2AHIF1A | |
| SCHEMBL3463435 | 0.93 | MEN1 (0.53) | MEN1KMT2AHIF1A | |
| SCHEMBL3463425 | 0.93 | MEN1 (0.53) | MEN1KMT2AHIF1A | |
| SCHEMBL2934569 | 0.93 | MEN1 (0.53) | MEN1KMT2AHIF1A | |
| SCHEMBL3464094 | 0.93 | MEN1 (0.53) | MEN1KMT2AHIF1A | |
| SCHEMBL3463643 | 0.93 | MEN1 (0.53) | MEN1KMT2AHIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115785157-B | Phosphono heterocyclic phosphonate compound, preparation and application thereof | 四川大学 | 2024-04-12 | — | — | CN | claimed |
| CN-116425794-A | Aryl phosphonate compound and preparation method thereof | 烟台大学 | 2023-07-14 | — | — | CN | claimed |
| CN-115785157-A | Phosphonic heterocyclic phosphonate compound and preparation and application thereof | 四川大学 | 2023-03-14 | — | — | CN | claimed |
| US-12100809-B2 | Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery | MITSUBISHI CHEMICAL CORPORATION (JP) | 2024-09-24 | — | — | US | disclosed |
| CN-115785157-B | Phosphono heterocyclic phosphonate compound, preparation and application thereof | 四川大学 | 2024-04-12 | — | — | CN | disclosed |
| CN-116425794-A | Aryl phosphonate compound and preparation method thereof | 烟台大学 | 2023-07-14 | — | — | CN | disclosed |
| CN-116075531-A | Process for preparing highly reactive isobutylene homo-or copolymers | 巴斯夫欧洲公司 | 2023-05-05 | — | — | CN | disclosed |
| CN-111433335-B | Lubricant composition and lubricating oil composition containing the same | 株式会社ADEKA | 2023-05-02 | — | — | CN | disclosed |
| US-20220149436-A1 | NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY | MITSUBISHI CHEMICAL CORPORATION (JP) | 2022-05-12 | — | — | US | disclosed |
| US-11283107-B2 | Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery | MITSUBISHI CHEMICAL CORPORATION (JP) | 2022-03-22 | — | — | US | disclosed |
| WO-2021107002-A1 | COMPOSITION CONTAINING COMPOUND HAVING POLYOXYALKYLENE CHAIN | 昭和電工マテリアルズ株式会社 | 2021-06-03 | — | — | WO | disclosed |
| EP-0547578-B1 | Light-sensitive composition | FUJI PHOTO FILM CO LTD (JP) | 1998-03-18 | — | — | EP | disclosed |
| US-5620762-A | MIXTURE FREE OF HALIDE SALT AND CONTAINING A POLYAMIDE, ACRYLONITRILE-BUTADIENE COPOLYMER, A PLASTICIZER, A STABILIZER, A CROSSLINKING AGENT AND A FILLER; LAP RESISTANCE TO THE FIBER-WORKING SURFACE | ARMSTRONG WORLD INDUSTRIES, INC. (US) | 1997-04-15 | — | — | US | disclosed |
| US-5424165-A | Printing durability, storage stability | FUJI PHOTO FILM CO., LTD. (JP) | 1995-06-13 | — | — | US | disclosed |
| EP-0547578-A1 | Light-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1993-06-23 | — | — | EP | disclosed |
| EP-0120981-B1 | RESIN ENCAPSULATION TYPE SEMICONDUCTOR DEVICE | KABUSHIKI KAISHA TOSHIBA (JP) | 1988-10-12 | — | — | EP | disclosed |
| US-4617584-A | GOOD HUMIDITY RESISTANCE, CORROSION RESITANCE; CURED NOVOLAC TYPE EPOXY RESIN, NOVOLAC PHENOLIC RESIN AND ORGANIC PHOSPHOROUS COMPOUND | TOKYO SHIBAURA DENKI KABUSHIKI KAISHA (JP) | 1986-10-14 | — | — | US | disclosed |
| EP-0120981-A1 | Resin encapsulation type semiconductor device | KABUSHIKI KAISHA TOSHIBA (JP) | 1984-10-10 | — | — | EP | disclosed |
| US-4349526-A | TRI-SUBSTITUTED PHENYLUREAS AS SOLVENT IN ANTHRAQUINONE PROCESS | DEGUSSA AKTIENGESELLSCHAFT (DE) | 1982-09-14 | — | — | US | disclosed |
| US-4075139-A | PROCESS OF MAKING A CURED RESOLE FOAM AND PRODUCT PRODUCED THEREFROM | THE UPJOHN COMPANY (US) | 1978-02-21 | — | — | US | disclosed |