⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7775713 | 1.00 | — | — | |
| SCHEMBL5715425 | 1.00 | — | — | |
| SCHEMBL7775483 | 1.00 | — | — | |
| SCHEMBL2826548 | 1.00 | — | — | |
| SCHEMBL7782834 | 1.00 | — | — | |
| SCHEMBL7775500 | 1.00 | — | — | |
| SCHEMBL7780911 | 1.00 | — | — | |
| SCHEMBL6654356 | 0.98 | — | — | |
| SCHEMBL4705495 | 0.91 | — | — | |
| SCHEMBL7510455 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111233342-A | Hydrophobic substrate, preparation method thereof, electronic screen and electronic device | 华南师范大学 | 2020-06-05 | — | — | CN | claimed |
| US-11084939-B2 | Anti-fogging coating composition and article | ADEKA CORPORATION (JP) | 2021-08-10 | — | — | US | disclosed |
| US-20190292376-A1 | ANTI-FOGGING COATING COMPOSITION AND ARTICLE | ADEKA CORPORATION (JP) | 2019-09-26 | — | — | US | disclosed |
| EP-3527629-A1 | ANTIFOGGING COATING MATERIAL COMPOSITION AND ARTICLE | Adeka Corporation (JP) | 2019-08-21 | — | — | EP | disclosed |
| EP-0825167-B1 | COMPOUNDS AND SURFACTANTS | ASAHI DENKA KOGYO KK (JP) | 2001-10-04 | — | — | EP | disclosed |
| US-5929290-A | A HYDROPHILIC POLYETHER HAVING A FLUORO-SUBSTITUTED ALKYL END GROUP AND A (METH)ALLYL GLYCIDYL END GROUP; EMULSIFIERS AND DISPERSANTS FOR EMULSION AND SUSPENSION POLYMERIZATION, RESP.; RESIN REFORMING AGENTS; ANTISOILANTS FOR POLYESTERS | ASAHI DENKA KOGYO K. K. (JP) | 1999-07-27 | — | — | US | disclosed |
| EP-0825167-A1 | COMPOUNDS AND SURFACTANTS | ASAHI DENKA KOGYO KABUSHIKI KAISHA (JP) | 1998-02-25 | — | — | EP | disclosed |
| EP-0316507-A2 | Graded index lens array | MITSUBISHI RAYON CO., LTD. (JP) | 1989-05-24 | — | — | EP | disclosed |